Exposure; Illumination Sources - Laser; Lamp; X-ray & other

Deep-ultraviolet (DUV) light sources. Excimer lasers using argon fluoride (ArF) or krypton fluoride (KrF) gases to generate light in the deep-ultraviolet spectrum.

Semiconductor inspection equipment, Various lamps, Light source equipment

Industrial and laboratory X-ray sources.

metrology solutions for thin films based on novel, rapid, non-contacting and non-destructive X-ray technology for the Semiconductors industry.

Digital-digital (Digital-Step-Scan, DiSS) devices and related components and devices.

Graphical Transfer Exposure Equipment.

Plasma assisted etch and deposition solutions. Failure analysis tools. Inspection and process control equipment.

Compact Light Source (CLS), a miniature synchrotron x-ray source

high power, highest performance femtosecond laser systems and the market definer for tabletop-scale coherent EUV and x-ray sources

Manufacturers of X-ray analysis, thermal analysis and non-destructive testing instruments.

Optical System / equipment: UV light sources, Laser Oscillators EO Glass: Color Glass Filters, Opto-Electronics Glass

Process equipment and metrology systems for current and future semiconductor manufacturing processes. Metrology, cryogenic cleaning, photomask repair systems. X-ray defect inspection and metrology equipment.

X-ray (DR) and computed tomography (CT) inspection systems for semiconductor and electronics.

MEMS equipment and components

EUV and plasma sources, EUV VUV and X-ray metrology equipment, modelling and simulation.

EUV light sources for lithography and optics research and development.

Integrated photonics foundry, supplier of products for microscopy and spectroscopy applications.