JSR Corporation

 , JP Manufacturer
Lithography materials: g-line, i-line, EUV photoresists, immersion lithography materials, spin-on hardmask, CMP slurry, post CMP cleaning materials. Display materials: Liquid Crystal Alignment Films, Protective Coating Materials, OLED materials

Jiangsu Hantop Photo-Materials Co.,Ltd

 , CN Manufacturer
Advanced first-line photoresist, DUV photoresist, which can be used for precision pattern transfer, integrated circuit manufacturing, MEMS manufacturing and microelectronics science and technology research