Reactant Gases

Electronic special gases and electronic chemicals, Silicon-based functional new materials, Bulk gas

Electronic Special Gas, Bulk Gas, Fine Chemicals Containing Fluorine, Industrial Gas And Standard Gas, Engineering Service And Gas Supply Technology

Ammomia; Arsine;Argon; Boron Trichloride;Liquid Helium; Nitrogen Trifluoride; chlorine;Hexafluoroethane;Tetrafluoromethane;Trifuoroethane;Octafluorocyclobtane;Sulfur Hexafluoride; Hydrogen Bromide; Hydrogen Chloride;Krypton; Neon; Nitrogen; Carbon Dioxide

electronic gas supply solutions including electronic gas production, electronic equipment manufacturing and bulk gas supply.

production and operation of industrial gases, including oxygen, nitrogen, argon, helium, neon, krypton, xenon, medical oxygen, hydrogen, standard gas, mixed gas, liquid oxygen, liquid nitrogen, liquid argon and other gases and liquids

Professional chemical defense research institute in China

Specialty gases: Signature Silane®, Dichlorosilane (DCS, or SiH2Cl2), Monochlorosilane (MCS or SiH3Cl), and Disilane (Si2H6). Electronic and Solar Grade Polysilicon

Ultra-Pure Polycrystalline Silicon for the semiconductor industry: Chips, Chunks, Cut Rod. Chlorosilane Gases for the semiconductor and fiber optic industries: Trichlorosilane (TCS), Silicon Tetrachloride (STC),

Polypropylene (PP), high-purity terephthalic acid (TPA), polyketone (POK), as well as nylon, polyester, TAC films used for wrapping or industrial & optical use, and special gases like NF3, 20%F2/N2 used in semiconductors, displays

Specialty Gas, Secondary Battery Materials, Inorganic Fluorine Compounds, Refrigerants

Gas and chemical materials for semiconductor and display manufacturing processes. Analysis for semiconductor and display processes and various industrial process gases.

nitrogen and electronics material gases as well as total solutions including related equipment in the global electronics sector.

Specialty gas and materials for semiconductors and displays. production and distribution of tungsten hexafluoride (WF6), monosilane (SiH4), dichlorosilane (SiH2Cl2), and disilane (Si2H6), NF3, photoresists.

Catalysts, adsorbents, specialty gases for semiconductor industry. Plant construction for these products.

Cleaning, Etching and Photolithography SELECTIPUR® Series Chemical Mechanical Planarization (CMP) FOTOPUR® Series Wet Deposition

Specialty and semiconductor gases, such as Monosilane, Disilane, and Silicon Tetrafluoride. Backgrinding UV and non-UV Tapes IGROS(TM)

Precursor materials (including MO source), electronic special gas and photoresists for IC, LCD, LED, OLED, power devices, semiconductor lasers

SiC epiwafers, chemicals for etching and deposition gases, PFC and etching gas treatment equipment.

Total gas/chemical supplying systems and engineerings that support the semiconductor and FPD industries.

Chemicals and gases for etching/cleaning, CVD/diffusion, implant/doping, eximer laser. Precursors.