Semiconductor wafer fabrication includes three main areas of assembly:
Lithography: Patterning Enhancement Materials, Photoresists, Process Materials, DSA, Spin-on Hardmask
Permanent Layer: Deposition Materials, Spin-on Dielectrics
Planarization
PHOTORESISTS FOR FRONT-END APPLICATIONS
We offer positive & negative tone photoresists in the lithography process for semiconductor device manufacturing and optoelectronics with offerings ranging from submicron to thick film resist products.
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PATTERNING ENHANCEMENT MATERIALS
Patterning enhancement materials offer solutions that improve process margin, defect control and higher resolution patterning steps associated in semiconductor fabrication of advanced integrated circuits.
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PROCESS MATERIALS
High purity wet process chemicals for photolithography process in semiconductor device production.
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DIRECTED SELF-ASSEMBLY (DSA)
Directed Self-Assembly (DSA) materials provide cost effective patterning solution which enable further chip scaling. DSA combines bottom-up patterning and conventional top-down patterning.
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SPIN-ON HARDMASK
Spin-on hard masks for advanced patterning technologies.
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DEPOSITION MATERIALS
Our deposition materials are chemistries enabling thin film Chemical Vapor Deposition and Atomic Layer Deposition of metals/oxides/nitrides for the next generation of advanced logic and memory devices.
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SPIN-ON DIELECTRICS
FEOL gap-filling solution with AZ Spinfil® spin-on dielectric technology.
Integrated circuit packaging is the final stage of semiconductor device fabrication. The housing or package supports the electrical contacts that connect the integrated circuit chip to the circuit board.
We offer:
Thick film resists
Interconnects & Conductive pastes
LED Packaging
PHOTORESISTS FOR BACK-END APPLICATIONS
We offer a variety of Thick Film Resists from conventional DNQ & chemically amplified positive tone to photo polymerizing negative tone to make patterned conductive circuitry in semiconductor packages.
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INTERCONNECTS & CONDUCTIVE PASTES
Transient Liquid Phase Sintering Paste for production in densely assembled integrated circuits.
SEMICONDUCTOR MATERIALS
DYNASOLVE 219 CURED SILICONE MATERIALS REMOVER
Dynasolve® 219 Cured Silicone Materials Remover is used for...
DYNASOLVE FS8320 SEMIAQUEOUS FLUX REMOVER FOR WAFER LEVEL PACKAGING
Dynasolve® FS8320 Semiaqueous Flux Remover for Wafer Level Packaging...
Dynasolve Pi4310 Polyimide Remover
Dynasolve® Pi4310 Polyimide Remover is a uniquely formulated chemistry...
DYNASTRIP AP7880T MULTIPURPOSE PHOTORESIST REMOVER
Dynastrip® AP7880T Multipurpose Photoresist Remover is a uniquely formulated...
DYNASTRIP AP7900A MULTIPURPOSE PHOTORESIST REMOVER
Dynastrip® AP7900A is a uniquely formulated photoresist remover designed...
DYNASTRIP AP7900C MULTIPURPOSE PHOTORESIST REMOVER
Dynastrip® AP7900C Multipurpose Photoresist Remover features our proven and...
DYNASTRIP DL88 MULTIPURPOSE PHOTORESIST REMOVER
Dynastrip® DL88 Multipurpose Photoresist Remover is a uniquely formulated...
DYNASTRIP DL9150 NON-TMAH MULTIPURPOSE PHOTORESIST AND POST-ETCH RESIDUE REMOVER
Dynastrip® DL9150 Non-TMAH Multipurpose Photoresist and Post-Etch Residue Remover...
DYNASTRIP DL9150B TMAH-FREE MULTIPURPOSE PHOTORESIST AND POST-ETCH RESIDUE REMOVER
Dynastrip® DL9150B Tetramethylammonium Hydroxide (TMAH)-Free Multipurpose Photoresist and Post-Etch...
FLIPSTRIP MULTIPURPOSE PHOTORESIST REMOVER
Flipstrip Multipurpose Photoresist Remover is a uniquely formulated chemistry...
ELECTRONIC MATERIALS
DYNASTRIP 7700 MULTIPURPOSE PHOTORESIST REMOVER
Dynastrip® 7700 Multipurpose Photoresist Remover is uniquely designed for...
ACT LINE
ACT 114
ACT® low‐hydroxylamine (HA) etch residue remover is formulated for...
ACT 273
ACT® 273 etch residue remover is a semi‐aqueous product...
ACT 410
ACT® 410 positive photoresist stripper is specially formulated for...
ACT 412
ACT® 412 positive photoresist stripper is specially formulated for...
ACT 690S
ACT® 690S etch residue remover and positive photoresist stripper...
ACT 690SX
ACT® 690SX is an organic solvent-based blend that is...
ACT 814
ACT® 814 etch residue remover is a dilute acid...
ACT 915A
ACT® 915A etch residue remover is a highly effective...
ACT 927C
ACT® 927C etch residue remover is a highly effective...
ACT 930
ACT® 930 etch residue remover and positive photoresist is...
ACT 935UP
ACT® 935 UP etch residue remover and positive photoresist...
ACT 940
ACT® 940 etch residue remover and positive photoresist is...
ACT 970
ACT® 970 etch residue remover and positive photoresist stripper...
ACT 970T
ACT® 970T etch residue remover and positive photoresist stripper...
ACT AS-65
ACT® ACT AS-65 etch residue remover and positive photoresist...
ACT CMI-S
ACT® CMI-S organic etch residue and positive photoresist stripper...
ACT CMIK-S
ACT® CMIK-S positive photoresist stripper is a proprietary formulation...
ACT EZSTRIP 20
ACT® EZSTRIP® 20 etch residue remover and positive photoresist...
ACT EZSTRIP 528H
ACT® EZSTRIP® 528H post‐etch residue remover is fluoride‐containing product...
ACT NE-111
ACT® NE-111 etch residue remover is a buffered, pH...
ACT NE-200
ACT® NE-200 etch residue remover is a fluoride‐containing product...
ACT NE14
ACT® NE-14 etch residue remover and positive photoresist stripper...
ACT NE89
ACT® NE-89 etch residue remover is a fluoride‐containing chemistry...
ACT XT-1100
ACT XT-1100 etch residue remover and positive photoresist stripper...
BPS LINE
BPS-100
BPS-100 aluminum oxide remover is a fluoride‐containing chemistry specially...
Versum Materials chemical mechanical planarization slurries
BPS-169
BPS-169 positive photoresist remover is an organic solvent blend...
BPS-170
BPS-170 aqueous copper oxide remover reduces contact resistance during...
BPS-729A
BPS-729A is a surfactant‐formulated low‐resistivity dicing solution has been...
BPS-729B
BPS-729B surfactant‐formulated dicing solution is used as an additive...
VERSUM CMP SOLUTIONS
DA NANO BARRIER CMP SLURRIES
Our highly tuneable DA Nano Barrier CMP Slurries allow...
DA NANO COPPER CMP SLURRIES
Our DA Nano Copper CMP Slurries products were designed...
DA NANO STI CMP SLURRIES
Our DA Nano STI CMP Slurries products offer high-purity...
DA NANO TUNGSTEN CMP SLURRIES
With industry-leading erosion characteristics, our low abrasive tungsten DA...
HIGH K DIELECTRICS
ADVANCED TITANIUM PRECURSORS
We offer a series of advanced Titanium (Ti) precursors...
GERMANINUM ANTIMONY TELLURIUM PRECURSORS
We offer a series of advanced Germaninum Antimony Tellurium...
GST PRECURSORS
We offer a series of advanced Germanium (Ge), Antimony...
LANTHANIDE PRECURSORS
Our Lanthanide (La) precursor is used in the High...
STRONTIUM PRECURSORS
Our Strontium (Sr) precursors for Thin Film Deposition of...
TELLURIUM (TE) PRECURSORS
We offer a series of advanced Germanium(Ge), Antimony (Sb)...
YTTRIUM PRECURSORS
Our Yttrium (Y) oxide precursor is used in the...
LOW K DIELECTRICS
DIETHOXYMETHYLSILANE (DEMS) PRECURSOR
Diethoxymethylsilane (DEMS®) Precursor is used as a silicon source...
POROUS DIETHYOXYMETHYLSILANE (PDEMS) PRECURSOR
Porous Diethyoxymethylsilane (PDEMS®) is an organosilicate glass used for...
Versum Materials Tetramethylcyclotetrasiloxane
TETRAMETHYLCYCLOTETRASILOXANE TOMCATS
Tetramethylcyclotetrasiloxane (TOMCATS) is used as a silicon source for...
Versum Materials tetramethylsilane
TETRAMETHYLSILANE 4MS EXTREMA
Tetramethylsilane (4MS) is a precursor for depositing carbon doped...
Versum Materials trimethylsilane
TRIMETHYLSILANE 3MS SEMICONDUCTOR
Semiconductor Grade Trimethylsilane (99.995%) is our standard high-purity offering...
POST-CMP CLEANS
CITRIC ACID
Citric Acid is a high purity cleaning solution for...
COPPEREADY BTA-02NB CORROSION INHIBITOR
CoppeReady® BTA-02NB corrosion inhibitor is a 0.02% Benzotriazole solution...
COPPEREADY BTA-1NB CORROSION INHIBITOR
CoppeReady® BTA-1NB corrosion inhibitor is a 1% Benzotriazole solution...
COPPEREADY CP72B ADVANCED CLEANING SOLUTION
CoppeReady® CP72B Advanced Cleaning Solution is an acidic, nonfluorinated,...
COPPEREADY CP98D ADVANCED CLEANING SOLUTION
CoppeReady® CP98D Advanced Cleaning Solution is a post‐CMP cleans...
Versum Materials chemical mechanical planarization slurries
ECP CLEAN
ECP Clean is a legacy cleaning chemistry for use...
Versum Materials Silicon tetrafluoride or Tetrafluorosilane
AIROPAK F2/N2 10% FLUORINE IN NITROGEN MIXTURE – COMMERCIAL GRADE
We have a long history as the world’s leading...
Versum Materials Silicon tetrafluoride or Tetrafluorosilane
AIROPAK F2/N2 20% FLUORINE IN NITROGEN MIXTURE – COMMERCIAL GRADE
We have a long history as the world’s leading...
Versum Materials Ammonia (NH3)
AMMONIA (BLUE)
Ammonia (NH3) is a high-purity grade for opto-electronic, RF...
Versum Materials Ammonia (NH3)
AMMONIA (VLSI)
Ammonia (NH3) VLSI is a high-purity grade for opto-electronic,...
Versum Materials Ammonia (NH3)
AMMONIA (WHITE)
Ammonia (NH3) is a high-purity grade for opto-electronic, RF...
Versum Materials Hydrogen Chloride
ANHYDROUS HYDROGEN CHLORIDE (HCL)
Anhydrous Hydrogen Chloride (HCl) is used for etching processes...
Versum Materials chemical mechanical planarization slurries
ANTIMONY PRECURSORS
We offer a series of advanced Germanium (Ge), Antimony...
Arsine (AsH3) ION-X Dopant Gas Storage and Delivery System
Arsine (AsH3) ION-X® Dopant Gas Storage and Delivery System...
Versum Materials Arsine Gas
ARSINE MEGABIT
We offer two versions of Arsine gas (AsH3). MEGABIT™...
Versum Materials Arsine Gas
ARSINE MEGABIT III
We offer two versions of Arsine gas (AsH3). MEGABIT™...
Versum Materials Boron Tribromide
BORON TRIBROMIDE EXTREMA
Boron tribromide EXTREMA® (BBr3) is a liquid boron source...
Versum Materials Bubbler Chemical Delivery Vessel
BREAKSEAL CROSS PURGE BUBBLER
Our Breakseal Cross Purge Bubbler offers a unique, patented...
Versum Materials Bis(tertiary-butylamino)silane (BTBAS)
BTBAS BIS(TERTIARY-BUTYLAMINO)SILANE EXTREMA
BTBAS Bis(tertiary-butylamino)silane EXTREMA® is a precursor for depositing silicon...
Versum Materials Carbon Dioxide Megabit
CARBON DIOXIDE MEGABIT
Carbon Dioxide MEGABIT™ (CO2) is a colorless, odorless, nonflammable,...
Versum Materials carbon tetrafluoride
CARBON TETRAFLUORIDE VLSI
Carbon Tetrafluoride VLSI (CF4) is used for chamber cleaning...
Versum Materials Chlorine Trifluoride (ClF3)
CHLORINE TRIFLUORIDE SEMI
Chlorine Trifluoride SEMI (ClF3) is a nearly colorless gas...
Versum Materials Chlorine Trifluoride (ClF3)
CHLORINE TRIFLUORIDE VLSI
Chlorine Trifluoride VLSI (ClF3) is a nearly colorless gas...
Versum Materials Chlorine Trifluoride (ClF3)
CHLORINE TRIFLUORIDE VLSI
Chlorine Trifluoride VLSI (ClF3) is a nearly colorless gas...
Versum Materials Hydrogen Chloride
CHLORINE VLSI
Chlorine VLSI (CL2) is a toxic, corrosive, greenish-yellow gas...
CUPRASELECT (CUTMVS)
CupraSelect® (CuTMVS) is a high purity liquid precursor for...
DEUTERIUM VLSI
Deuterium VLSI (99.999%) is a high purity grade for...
Versum Materials Diborane
DIBORANE IN HYDROGEN MIXTURE
We offer Diborane in Hydrogen Mixtures.
Versum Materials Difluoromethane
DIFLUOROMETHANE HALOCARBON 32
Difluoromethane Halocarbon 32 (CH2F2) is an anisotropic etching gas...
Versum Materials Germane
GERMANE
Germane (GeH4) is a gas used for depositing the...
Versum Materials Germane
GERMANE HYDROGEN MIXTURE 10%
Germane Hydrogen Mixture 10% ±0.2% Mixture is used in...
Versum Materials Hafnium Tetrachloride
HAFNIUM TETRACHLORIDE
Hafnium tetrachloride (HfCl4) is a solid source material for...
Versum Materials hexafluorobutadiene
HEXAFLUOROBUTADIENE NCTRL
Hexafluoro-1,3-butadiene (Hexafluorobutadine C4F6) is used for dielectric etch applications....
Versum Materials hexafluorobutadiene
HEXAFLUOROBUTADINE VLSI
Hexafluorobutadine (Hexafluoro-1,3-butadiene C4F6 is used for dielectric etch applications....
Versum Materials Hexafluoroethane
HEXAFLUOROETHANE HALOCARBON 116
Hexafluoroethane Halocarbon 116 (C2F6) is our highest purity offering...
Versum Materials Hydrogen Chloride
HYDROGEN CHLORIDE VLSI
Hydrogen Chloride (HCl) is used in various surface cleaning...
Versum Materials hydrogen selenide
HYDROGEN SELENIDE UHP
Hydrogen Selenide (H2Se) UHP Grade is our high purity...
ISOTOPICALLY‐ENRICHED BF3 (BORON TRIFLUORIDE) ION‐X DOPANT GAS STORAGE AND DELIVERY SYSTEM
Isotopically‐Enriched BF3 (Boron Trifluoride) ION‐X® Dopant Gas Storage and Delivery...
Versum Materials nitrogen trifluoride
NITROGEN TRIFLUORIDE NG
Nitrogen Trifluoride NG (NF3) is used in silicon semiconductor...
Versum Materials nitrogen trifluoride
NITROGEN TRIFLUORIDE VLSI
Nitrogen Trifluoride (NF3) is used in silicon semiconductor process...
Versum Materials Nitrous oxide
NITROUS OXIDE VLSI
Nitrous Oxide (N2O) is an oxidant for depositing various...
Versum Materials octafluorocyclobutane
OCTAFLUOROCYCLOBUTANE VLSI
Octofluorocyclobutane VLSI (C4F8) (99.999%) is a colorless, odorless, non-flammable...
Versum Materials Octafluorocyclopentene
OCTAFLUOROCYCLOPENTENE C5F8
Octofluorocyclopentene C5F8 (99.99%) VLSI Grade is our highest purity...
Versum Materials octafluoropropane
OCTAFLUOROPROPANE MEGACLASS
Octafluoropropane, Megaclass® Grade, is our standard high purity grade....
Versum Materials Pentakis Dimethylamino Tantalum PDMAT Pentakis-dimethylamino Tantalum (PDMAT)
PENTAKIS DIMETHYLAMINO TANTALUM PDMAT
Pentakis-dimethylamino Tantalum (PDMAT) is a solid source material for...
Versum Materials phosphine
PHOSPHINE IN ARGON MIXTURE
We offer Phosphine (PH3) in Argon (Ar) mixtures.
Versum Materials phosphine
PHOSPHINE IN HYDROGEN MIXTURE
We offer Phosphine (PH3) in Hydrogen mixtures.
PHOSPHINE ION‐X DOPANT GAS STORAGE AND DELIVERY SYSTEM
Phosphine (PH3) ION‐X dopant gas storage and delivery system...
Versum Materials phosphine
PHOSPHINE MEGABIT II
We offer Phosphine (PH3) in two grades for use...
Versum Materials phosphine
PHOSPHINE MOCVD
We offer Phosphine (PH3) in two grades for use...
Versum Materials Phosphoryl chloride
PHOSPHOROUS OXYCHLORIDE POCL3 EXTREMA
Phosphorus Oxychloride (POCl3) Extrema® is a liquid Phosphorus used...
Versum Materials propylene
PROPYLENE ELECTRONIC
Propylene (C3H6) is a gas used for building up...
Versum Materials Silicon tetrafluoride or Tetrafluorosilane
SILICON TETRAFLUORIDE VLSI
Silicon Tetrafluoride (SiF4) is a source of fluorine for...
Versum Materials Tetraethyl orthosilicate
TETRAETHYL ORTHOSILICATE TEOS
Tetraethyl Orthosilicate (TEOS) is used as a semiconductor silicon...
TETRAKIS DIMETHYLAMINO TITANIUM TDMAT
Tetrakis-dimethylamino Titanium (TDMAT) is a liquid chemical source suitable...
TITANIUM PRECURSORS
We offer Titanium Precursors for Thin Film Deposition of...
Versum Materials Titanium tetrachloride
TITANIUM TETRACHLORIDE TICL4
Titanium Tetrachloride (TiCl4) is a liquid source material for...
TRANS-LC
Trans-LC® (Trans 1,2-Dichloroethylene) is an ozone-safe liquid chlorine source for...
Versum Materials trichlorosilane
TRICHLOROSILANE MEGABIT
Trichlorosilane TCS Megabit™ Grade is our standard high purity...
Versum Materials triethyl borate
TRIETHYLBORATE
Triethylborate (TEB) is a liquid boron source used for...
Versum Materials Triethyl Phosphate
TRIETHYLPHOSPHATE
Triethylphosphate (TEPO) is a liquid phosphorus source used in...
TRIFLUOROMETHANE HALOCARBON 23
Trifluoromethane Halocarbon 23 (CHF3) is an Anisotropic etching gas...
TRIFLUOROMETHANE HALOCARBON 23 VLSI
Trifluoromethane Halocarbon 23 VLSI (CHF3) is an Anisotropic etching...
Versum Materials trimethylborate
TRIMETHYLBORATE
Trimethylborate (TMB) is used as a liquid boron dopant...
Versum Materials trimethylphosphate
TRIMETHYLPHOSPHATE
Trimethylphosphate (TMPO) is a liquid phosphorus source used in...
Versum Materials trimethylphosphite
TRIMETHYLPHOSPHITE
Trimethylphosphite (TMPI) is a liquid phosphorus source used with...
Versum Materials Tungsten hexafluoride
TUNGSTEN HEXAFLUORIDE MEGACLASS
Tungsten Hexafluoride (WF6), Megaclass grade (99.9995%), is our highest...
Versum Materials Tungsten hexafluoride
TUNGSTEN HEXAFLUORIDE SEMICONDUCTOR
Tungsten Hexafluoride (WF6), Semiconductor grade (99.9%), is a toxic,...
Versum Materials Xenon difluoride
XENON DIFLUORIDE ELECTRONIC
Xenon Difluoride (XeF2) is a highly selective isotropic etching...
DELIVERY SYSTEMS & SERVICES
CLEANING EQUIPMENT
S-1087 EXHAUSTED WORK STATION
Our S-1087 Exhausted Work Station is a self-contained, manual...
licristal®
Licristal® is liquid crystal material for high-performance displays
licristal®XtraBoost
High-performance liquid crystal singles for advanced quality and reliability
licristal®XtraBright
High-performance liquid crystals for ultra transmission
licristal®XtraBrilliant
High-performance liquid crystal singles for superb contrast
licristal®XtraFast
High-performance liquid crystal singles for super-fast switching
licrivue®
licrivue® reactive mesogens improve image quality and energy efficiency in displays
livilux®
OLED materials for vaporization and printing processes.
Spinfil®
Spinfil® provides an insulating dielectric barrier coating for use in the manufacture of semiconductor integrated circuits. These ICs are assembled into displays, memory, and consumer devices.
