OMMIC, based in France, near Paris, is a pioneer and a leading supplier of epitaxy, foundry services and MMICs based around the most advanced III-V processes, in particular in GaN and GaAs semiconductor technologies.

Formerly Philips Semiconductor, today an independant SME, OMMIC was founded on January 1st, 2000. We are exploiting more than 40 years background in III-V Materials, Design and Processing. Thanks to its innovative solutions, OMMIC enables its customers to be leaders in a more and more demanding market place.

THE WORLD’S FIRST 6-INCH GAN/SI LINE IN PRODUCTION
In 2017, OMMIC inaugurated its new production clean room of 800 m² which allowed from the first months to multiply the volume of production by 2 and eventually by 7 in connection with the hiring plan and therefore to address the high volume market of 5G.

OMMIC is supplying MMIC (Monolithic Microwave Integrated Circuit) based on III-V materials (GaN, GaAs and InP). The MMIC use gold bonding pads and backside metallization and are fully protected with Silicon Nitride passivation to get the highest level of reliability.

OMMIC develops its own processes with a fully open foundry Policy. This means anybody can use it with up-to-date design kits. Before moving to production, OMMIC offers free design rule checking (DRC) to ensure designs can be manufactured safely. OMMIC offers Full Wafer run for maximum flexibility or Multi Project Wafer (MPW) for cost-effective prototypes.

III–V technologies are widely used for the excellent performance they can offer. OMMIC process portfolio includes GaAs pHEMT & mHEMT technology, InP HBT technology and GaN HEMT technology. These processes provide cut-off frequencies as high as 400 GHz enabling new application at always higher frequencies. OMMIC processes are built for high reliability and space application. This is why all our processes in production are either spaced qualified by the European Space Agency (ESA), or in the process of being qualified.

OMMIC makes available its expertise to help customers at each stage of the design, packaging, test and qualification of his product to ensure the very highest level of quality and reliability.

OUR FAB
OMMIC consits of 5 main buildings with 1500 m² of clean rooms with an ISO 5 and ISO 3 which are fully devoted to III-V IC development and fabrication. Our wafers are delivered with electrical properties guaranteed by the measurement of specific test modules added on the mask set, named PCM (Process Control Monitor). Our processes and our equipments are also followed with SPC (Statistical Process Control).

THE WORLD’S FIRST 6-inch GaN/Si LINE IN PRODUCTION
In 2017, OMMIC inaugurated its new production clean room of 800 m² which allowed from the first months to multiply the volume of production by 2 and eventually by 7 in connection with the hiring plan and therefore to address the high volume market of 5G.

This market will represent a production of more than 2 million chips per year.

EPITAXY
At OMMIC, we have a powerful R&D department developing our own processes starting from epitaxial structure. We have a number of MOCVD reactors and supply epi wafers in 3-inch, 4-inch and 6-inch.

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