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Double Sided Mask Alighners

Double-sided mask aligners are a type of lithography equipment used in MEMS fabrication that allows for the alignment and exposure of both sides of a substrate with different patterns. In traditional mask aligners, a substrate is aligned and exposed to a pattern on one side using a mask, and then the substrate is flipped and the other side is aligned and exposed to a different pattern. In contrast, double-sided mask aligners are designed to expose both sides of a substrate simultaneously. This is done by sandwiching the substrate between two masks, each with a different pattern. The aligner then uses a series of optical systems to align both sides of the substrate with their respective masks and expose them to the desired pattern. Double-sided mask aligners have several advantages over traditional single-sided aligners. One major advantage is that they can produce more complex and intricate devices by allowing for the fabrication of 3D structures. This is because they enable the creation of features that overlap on both sides of the substrate, which can be used to create structures such as microfluidic channels or through-silicon vias. Another advantage of double-sided mask aligners is that they can improve the throughput of the lithography process. By exposing both sides of the substrate simultaneously, double-sided mask aligners can reduce the number of processing steps and improve the overall efficiency of the fabrication process. Double-sided mask aligners are commonly used in the production of MEMS devices, such as microfluidic systems, optical sensors, and lab-on-a-chip devices, among others.

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Cerma Precision Inc

, JP Manufacturer

Mass production projection exposure system, CVS equipment QUALILAB ELITE, AXP2.0-DFP2, UV-LED optics for aligner/cure, UV exposure irradiation unit

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PRO Win Co Ltd.

, KR Manufacturer

Mask Aligner, Total Lithography Solution, Spin Coater System, Mask Spin Cleaning System, Wet Station System, Exposure System, Glass Scribing Machine

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