Hotplates: Our HP series
SAWATEC supplies various hotplates for typical soft bake and hard bake processes in lithography, MEMS and similar applications. Outstanding features of the manual hotplates are their robust design and ease of operation. The extensive HP series can be used for wafers up to 300mm or 12×12 inch substrates.
These instruments are available as portable bench-top, bench-mounted or mobile cabinet units.
Spin Modules: Our SM series
The manual spin modules by SAWATEC are used for substrates with no or very low surface structures. The user-friendly operation and large range of application-specific chucks facilitate a high degree of flexibility in terms of the substrates that can be used. All commercial photoresists can be coated homogeneously on wafers up to 300mm or 9×9 inch substrates.
The SM series is convincing due to its high level of uniformity and repeatability, coupled with easy operation and comfortable handling. In order to keep the cleaning effort for the process chamber to a minimum, SAWATEC has developed a comprehensive and good value bowl protector. This bowl protector is easy to remove and dispose of once the process has been completed. Due to the high-quality design, the maintenance effort is minimal. Therefore, the SAWATEC spin modules are preferentially used for laboratories, R&D, pilot projects and institutes.
The compact SM series is supplied as portable bench-top, bench-mounted or mobile cabinet units.
Spray Coaters: Our iSPRAY series
For substrates with a highly structured wafer topography, deep MEMS structures or a non-planar surface texture, the iSPRAY-300 by SAWATEC ensures that the coating is as homogeneous as possible. It is a high-precision spray coater for manual spray coating or spray development processes and it is used specifically in research and development laboratories, for pilot productions and small production units in MEMS fabrication.
Accessories
The standard spray coating method in the direction of X and Y can additionally be combined with a rotating spin chuck (with or without heating), which improves the distribution of the photoresist for certain topographies and increases the diversity of the coating.
Furthermore, the iSPRAY-300 can be equipped with a hotplate. With this, even photoresists with a higher viscosity can be processed with little accumulation in cavities and reliable coating of the edges.
Developers: Our SMD series
The development of the exposed photoresist is one of the most critical process steps, therefore special care need to be given to the selection of the development process and its parameters (temperature, development time, etc.). The SAWATEC developers can be used for puddle or spray development, in which the optimum process being chosen based on application-technical and economic criteria.
Each substrate is individually developed respectively etched in the spray development and the exposed areas are continuously sprayed with fresh developing or etching agent to prevent that the developer getting saturated. The advantage of the spray development compared to the puddle development is that very small structures can be released and a significantly lower developer solution respectively etching agent is required.
The SMD developers by SAWATEC are convincing due to their high process performance, low chemical consumption as well as reliable repeatability, even with thick photoresist layers. Due to the user-friendly operation and easy cleaning, these instruments are ideally suited for laboratories, R&D, institutes and pilot projects.
The instrument is available as bench-mounted or mobile cabinet unit.
Spin Rinser Dryers: Our SRD series
The spin rinser dryers of the SRD series can be used to rinse assembled wafer cassettes following wet-chemical processes and effciently dried by means of centrifugal force and heated nitrogen. The SAWATEC spin rinser dryers are equipped with closed stainless steel process chambers and integrated imbalance compensation.
The SRD-series is characterized by its excellent process quality and high productivity coupled with easy handling. They can be used for wafers measuring 50mm to 200mm, with a maximum load capacity of 4 wafer cassettes, each containing 25 wafers.
These instruments are available as a cabinet, double-decker or as an integral part of wet-chemical systems.
Cluster Systems: Our CS series
The SAWATEC cluster systems are the perfect solution for customers looking for fully automatic cassette-to-cassette applications. The modular CS series is comprised of an optical prealigner station and three flexible stations, which can be equipped with a number of process-oriented instruments. SAWATEC has developed appropriate configurations for standard process steps.
Due to its modular, flexible design with an automatic central load station, the cluster system allows the customer to implement individual, customer- specific solutions in the production (Challenger series).
Spin Chuck Range
The spin chuck range by SAWATEC offers the right selection for all Substrate sizes and substrate materials.
For perfect coating results, the spin chucks are supplied in different sizes, materials and designs. Depending on the application, one-piece or two-piece spin chuck sets with optical centring aid are used.
To ensure that the reverse side of the substrate does not become contaminated, it is the crucial to select the optimal spin chuck size and specific chuck design. Replacing the spin chucks is very easy and does not require any tools.
For proper operation of the spin modules and to achieve a high uniformity, it is important that only original Sawatec spin chucks are used. When using foreign brand spin chucks we cannot accept any liability with respect to the given specifications and process safety.
Bowl protector
In order to keep the cleaning effort for the spin module process chamber to a minimum, SAWATEC has developed an inexpensive bowl protector. This protective insert is easy to remove and dispose of once the process has been completed.
Precision dosing pumps
The dosing pumps by SAWATEC feature a wide range of media viscosities, coupled with a high-precision delivery volume.
The application of hard-wearing, inert materials results in an excellent chemical compatibility with the most diverse fluids. Due to the compact, space-saving design, easy flushing and cleaning, long lifetime and low-cost maintenance, the pumps are not only used in our own instruments and systems, but also preferentially by a variety of OEM customers.
The different dosing pumps can be used for a wide range of applications and are ideally suited for use in the semiconductor industry, in the field of MEMS, in medical technology, in the chemical/pharmaceutical industry, in bottling plants and in analytical and laboratory apparatus.
Dosing valve
The diaphragm dosing valve DV-257rounder among the diaphragm dosing valves. It is perfectly suited for any type of media with low to medium viscosity and explosion-proof processes.
