Electron Beam Exposure Equipment

EUV HVM Reflectometer, EUV Accelerated Exposure Tool, Actinic Image Review System (AIRES®), EUV Pellicle Transmission Measurement System, EUV Pellicle High-Speed Mapping Tool, EUV N&K and Phase Measurement Tool, EUV Resist Outgassing Tool

EVAPORATION SOURCE (Point Source, Linear Source) and VACUUM SYSTEM (OLED System, Sputtering System)

EB Mask Writer, Mask Inspection System, Epitaxial Reactors

Sputter, E-Beam, Thermal Evaporator, ALD, PEALD, RIE, PECVD, and LPCVD in manual, Semi-Automated or Fully Automated Solutions.

Mask Aligner, Total Lithography Solution, Spin Coater System, Mask Spin Cleaning System, Wet Station System, Exposure System, Glass Scribing Machine

Digital-digital (Digital-Step-Scan, DiSS) devices and related components and devices.

Precision technology manufacturer for nanofabrication, electron beam lithography, FIB SEM nanofabrication, nanoengineering, and reverse engineering applications

Microscopy: TEM, SEM, Ion Beam millling and imaging, ion slicer, electrone probe microanalyzer, Auger microprobe, specrometers, EB lithography system, additive manufacturing,

Maskless photolithography system, micro and nanofabrication services.

50kV Variable Shaped Beam lithography systems, which serve customers in both, semiconductor industry as well as advanced research, optics and several emerging markets.

Manufacturer of lithography equipment

Mask writer, maskless lithography and inspection systems.