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Pattern Generator

A pattern generator, also known as a photomask or reticle, is a device used in the semiconductor industry to create patterns for the transfer onto a substrate, such as a semiconductor wafer, during the photolithography process. The pattern generator is essentially a transparent plate with a pattern of opaque and clear regions that define the desired pattern to be transferred onto the substrate. The pattern is created using a process such as electron beam lithography, which involves writing the pattern onto the plate using a focused beam of electrons. The pattern generator is used in conjunction with a light source and a projection system to transfer the pattern onto the substrate. The light source illuminates the pattern generator, and the projection system projects the pattern onto the substrate, where it is then used to define the locations for subsequent processing steps, such as deposition or etching. The choice of a pattern generator for a specific semiconductor manufacturing process depends on several factors, including the size of the substrate, the desired resolution of the pattern, and the specific requirements of the process, such as compatibility with high-temperature processing or exposure to certain light sources. A pattern generator and a contact printer are two different tools used in the semiconductor industry for transferring patterns onto a substrate, such as a semiconductor wafer. A pattern generator, also known as a photomask or reticle, is a transparent plate with a pattern of opaque and clear regions that define the desired pattern to be transferred onto the substrate. The pattern is created using a process such as electron beam lithography, and the pattern generator is used in conjunction with a light source and a projection system to transfer the pattern onto the substrate. A contact printer, on the other hand, operates by pressing a template or mask, which has the desired pattern, against the substrate and exposing the substrate to a light source or energy source that causes a photochemical or thermal reaction. This results in a change in the physical or chemical properties of the substrate, allowing for the transfer of the pattern. In summary, the main difference between a pattern generator and a contact printer is the method used to transfer the pattern onto the substrate. A pattern generator uses a projection system and light source to transfer the pattern, while a contact printer uses direct contact and a light source or energy source to transfer the pattern. The choice of which tool to use depends on the specific requirements of the semiconductor manufacturing process.

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EUV Tech Inc

, US Manufacturer

EUV HVM Reflectometer, EUV Accelerated Exposure Tool, Actinic Image Review System (AIRES®), EUV Pellicle Transmission Measurement System, EUV Pellicle High-Speed Mapping Tool, EUV N&K and Phase Measurement Tool, EUV Resist Outgassing Tool

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aBeam Technologies, Inc

, US Manufacturer

Software for simulation and optimization of nanolithography, mask-making, metrology and defect inspection, as well as design and optimization of semiconductor equipment. We also sell SEM functionality extension tools.

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SVG Optronics Co. Ltd

, CN Manufacturer, Custom Manufacturer

Functional optical films and devices, for display, lighting, capacitive touch panels. technology transfering in the nano-manufacturing systems including UV maskless lithography, nano-patterning, roll-to-roll nano-imprinting and 3D light field printing.

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Simax Shanghai Company Limited

, CN Manufacturer

Maskless Laser Direct Writing lithography machine.

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Heidelberg Instruments Mikrotechnik GmbH

, DE Manufacturer

Maskless laser lithography systems for the fabrication of micro-structures, serving the global photolithography community in both the direct writing field and in photomask fabrication.

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LumArray, Inc.

, US Manufacturer

Maskless photolithography system, micro and nanofabrication services.

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Litho Tech Japan Corporation

, JP Manufacturer

Manufacturer of lithography equipment

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Toray Engineering Co, Ltd

, JP Manufacturer

Semiconductor and FPD production equipment

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