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Pattern Generator

A pattern generator is a type of equipment used in the semiconductor manufacturing process to create precise patterns on silicon wafers. This is typically done through photolithography, which involves projecting a patterned light onto a photosensitive material on the wafer to transfer the pattern onto the surface. The pattern generator is responsible for creating the light pattern that will be used in photolithography. This is done by using a mask with the desired pattern, and shining light through the mask to project the pattern onto the wafer. The light is typically ultraviolet (UV) light, and the pattern generator must be able to produce light with precise wavelengths and intensities to ensure accurate pattern transfer. In modern semiconductor manufacturing, pattern generators are essential tools, allowing manufacturers to create complex and high-density ICs with precise features and dimensions. Here are some of the major manufacturers and models of pattern generators: ASML - TWINSCAN NXT Nikon - NSR-S620D Canon - CGLaser Excimer LAM Research - Nexion TEL - PulseDempo Note that this is not an exhaustive list and there may be other manufacturers and models of pattern generators available in the market. These companies are among the leading suppliers of photolithography equipment to the semiconductor industry and are known for producing high-quality, reliable pattern generators. The key parameters of pattern generators in photolithography for semiconductor manufacturing are: Wavelength: The wavelength of the light used in photolithography is critical to ensuring accurate pattern transfer. Pattern generators must produce light with precise wavelengths that are optimized for the photoresist and substrate materials being used. Intensity: The intensity of the light used in photolithography must be carefully controlled to ensure accurate pattern transfer. Too much intensity can cause the photoresist to become over-exposed, leading to defects in the pattern, while too little intensity can result in an under-exposed pattern. Uniformity: The uniformity of the light used in photolithography is critical to ensuring accurate pattern transfer across the entire wafer. Pattern generators must produce light with a high degree of uniformity to ensure consistent results across the entire surface of the wafer. Spot size: The spot size of the light projected by the pattern generator is an important factor in determining the minimum feature size that can be produced in the photolithography process. Smaller spot sizes allow for finer patterns to be produced, while larger spot sizes limit the minimum feature size that can be produced. Stability: The stability of the light source is critical to ensuring consistent results over time and across multiple wafers. The pattern generator must maintain a consistent light output to ensure reliable results in the photolithography process. Dynamic range: The dynamic range of the light source refers to its ability to handle a wide range of light intensities, from low to high, without degradation. High dynamic range is important for producing patterns with varying feature sizes and intensities in a single exposure.

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EUV Tech Inc

, US Manufacturer

EUV HVM Reflectometer, EUV Accelerated Exposure Tool, Actinic Image Review System (AIRES®), EUV Pellicle Transmission Measurement System, EUV Pellicle High-Speed Mapping Tool, EUV N&K and Phase Measurement Tool, EUV Resist Outgassing Tool

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aBeam Technologies, Inc

, US Manufacturer

Software for simulation and optimization of nanolithography, mask-making, metrology and defect inspection, as well as design and optimization of semiconductor equipment. We also sell SEM functionality extension tools.

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NuFlare Technology Inc

, JP Manufacturer

EB Mask Writer, Mask Inspection System, Epitaxial Reactors

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SVG Optronics Co. Ltd

, CN Manufacturer, Custom Manufacturer

Functional optical films and devices, for display, lighting, capacitive touch panels. technology transfering in the nano-manufacturing systems including UV maskless lithography, nano-patterning, roll-to-roll nano-imprinting and 3D light field printing.

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Toray Engineering Co, Ltd

, JP Manufacturer

Semiconductor and FPD production equipment

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Planar JSC (KBTEM)

, BY Manufacturer, Custom Manufacturer, Service Company

Manufacturer of front end and assembly and inspection, metrology equipment for semiconductor production.

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