Panshi Innovation Technology Group (hereinafter referred to as "Panshi Innovation") is an advanced technological innovation enterprise of electronic equipment and intelligent manufacturing integrating independent research and development, design and process equipment manufacturing. Panshi Innovation brings together many well-known management and technology R&D talents in the industry, constantly innovating technology research and development, constantly meeting the ever-changing market demand in the field of electronic equipment and intelligent manufacturing, and constantly breaking through international technical barriers.

       Relying on years of high-tech R&D strength and experience in the implementation of whole-line solution projects, Panshi Innovation has realized that it is based on scientific and technological innovation, takes the actual interests of customers as its own responsibility, focuses on the future of global high-tech development, and is committed to electronic equipment manufacturing, intelligent equipment manufacturing and overall The corporate mission of the solution is committed to the wisdom of the rock and the grand blueprint of the future.

       Panshi's innovative marketing service system has covered the whole country and many countries at home and abroad. With a flexible and innovative cooperation model and customer value creation as the foundation, the company has built an innovative technology research and development platform to promote industrial progress, enhance the core strength of domestic brands, and create wisdom. Infinite possibilities for the future.

 


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crystal growth equipment
· SIC single crystal furnace
· High voltage VGF single crystal furnace
· VTM single crystal furnace
· Polycrystalline furnace
· Single tube diffusion furnace
· Vertical Diffusion Furnace
· Vertical annealing furnace
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Relying on the development of high-end semiconductor equipment, through the two sectors of high-end semiconductor equipment and vacuum technology, establish an industrialized management pattern of electronic equipment

SIC single crystal furnace
Mainly used in silicon carbide, aluminum nitride single crystal growth, 6, 8 inch SIC crystal growth

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High Voltage VGF Single Crystal Furnace
Mainly used in single crystal growth of semiconductor indium phosphide, gallium phosphide and other materials. It is a key device for the manufacture of II-VI and III-V compound semiconductor materials

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VTM single crystal furnace
Mainly used in single crystal growth of various compound semiconductor materials such as cadmium zinc telluride, cadmium telluride and indium antimonide

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Polycrystalline furnace
Mainly used in polycrystalline synthesis equipment of GaAs, CdTe and other compound materials

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Single Tube Diffusion Furnace
Mainly used in high temperature diffusion, oxidation, annealing and other processes

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Vertical Diffusion Furnace
Mainly used in high temperature diffusion, oxidation, annealing and other processes

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Vertical Annealing Furnace
The new vertical annealing furnace is being invested in research and development, so stay tuned!

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Back to topRelying on the development of high-end semiconductor equipment, through the two sectors of high-end semiconductor equipment and vacuum technology, establish an industrialized management pattern of electronic equipment

SIC single crystal furnace
Mainly used in silicon carbide, aluminum nitride single crystal growth, 6, 8 inch SIC crystal growth

check the details

High Voltage VGF Single Crystal Furnace
Mainly used in single crystal growth of semiconductor indium phosphide, gallium phosphide and other materials. It is a key device for the manufacture of II-VI and III-V compound semiconductor materials

check the details

VTM single crystal furnace
Mainly used in single crystal growth of various compound semiconductor materials such as cadmium zinc telluride, cadmium telluride and indium antimonide

check the details

Polycrystalline furnace
Mainly used in polycrystalline synthesis equipment of GaAs, CdTe and other compound materials

check the details

Single Tube Diffusion Furnace
Mainly used in high temperature diffusion, oxidation, annealing and other processes

check the details

Vertical Diffusion Furnace
Mainly used in high temperature diffusion, oxidation, annealing and other processes

check the details

Vertical Annealing Furnace
The new vertical annealing furnace is being invested in research and development, so stay tuned!

Relying on the development of high-end semiconductor equipment, through the two sectors of high-end semiconductor equipment and vacuum technology, establish an industrialized management pattern of electronic equipment

ALD atomic layer deposition equipment
ALD atomic layer deposition equipment is mainly used in integrated circuits, microelectronics, quantum dots, new energy and other industries.

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Magnetron Sputtering Coating System
Magnetron sputtering coating systems are widely used in consumer electronics, chip manufacturing, photovoltaics and many other fields, and can prepare metal films, insulating films, optical films, magnetic films, etc.

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Large area magnetron sputtering system
Mainly used in photovoltaic industry, functional glass and display industry.

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Magnetron Sputtering Coating System
Mainly used in consumer electronics, functional thin film, photovoltaic and other industries.

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Resistance Evaporation Coating Machine
It is mainly used in teaching, scientific research experiments in universities and scientific research institutes, as well as early exploratory experiments and development of new products in production enterprises. It can be used to prepare metal films, organic films and scanning electron microscope samples.

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Organic Evaporation Glovebox Coating System
It is mainly used in special equipment for industrial research and development of perovskite solar cells, OLEDs, lithium batteries, metal electrode films, etc.

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Vacuum tube furnace
It is mainly used in the sublimation and purification of new materials, the pre-sintering and annealing of electronic ceramic products, etc. It can also be used as a CVD coating equipment, and an external plasma generator can be installed.

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Vacuum Carbon Coating Furnace
It is mainly used in the growth process of semiconductor crystal materials. Carbon plating on the inner wall of the quartz crucible can effectively block the reaction between the high temperature solution and the quartz crucible, which is conducive to the production of complete and high-quality single crystals.


Tank wet cleaning equipment
Mainly used in the field of integrated circuits, the advanced cleaning process effectively removes the fine particles, metal residues, photoresist residues and other problems on the surface of the wafer. It is mostly used in the cleaning and drying process of silicon, sapphire and GaAs wafers.


Vertical dryer
Mainly used in high cleanliness washing and drying processes of 2-8 inch semiconductor wafers, masks, various substrates and other materials.

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cleaning table
It is mainly used in the cleaning process of raw materials and auxiliary materials.

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Sealing furnace
Mainly used in vacuum sealing welding process of quartz tube and rapid annealing process.

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glove box
It can be integrated with special lamp production equipment, laser equipment, vacuum coating equipment, vacuum oven, water oxygen display system, smoke filter system, solvent purification system, gas purification system, low temperature refrigerator, etc.

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