Since 1989 Trion Technology, Inc. has become a manufacturing leader in precision plasma etch, photoresist strip, and deposition systems specifically designed to meet the unique demand for the small to medium run services required in the semiconductor, telecommunication, MEMS and photonic industries worldwide. Capabilities include lithography, wafer bonding, plasma etch and deposition, sputter, evaporation, thermal oxidation and metrology.
• Plasma Etch Systems include GaN Etch, GaAs Etch, SiO2 Etch, Si3N4 Etch.
• Plasma Deposition Systems include SiO2 Deposition, Si3N4 Deposition.
• Photoresist Stripping Systems/Ashers/Descum.
Products:
• Phantom - Reactive Ion Etcher (RIE) with Inductively Coupled Plasma (RIE-ICP) option
• Minilock Phantom - Loadlocked RIE with ICP option
• Orion - Plasma Enhanced Chemical Vapor Deposition (PECVD) System
• Minilock Orion - Loadlocked PECVD System
• Oracle - Production Cluster Tool with combination Ash/Etch/Deposition capability
• Apollo - Photoresist Strip/Ash/Descum
• Gemini - Multi-chamber Photoresist Strip/Ash/Descum
