Reactive Ion Etching

Poly Etcher System (Conductor Etcher System), Metal Etcher System, Oxide Etcher System (Dielectric Etcher System)

EVAPORATION SOURCE (Point Source, Linear Source) and VACUUM SYSTEM (OLED System, Sputtering System)

ICP ETCHER, DRIE ETCHER, CCP ETCHER, LED ETCHER, NANO-IMPRINTER

Ion etching cleaning tools, plasma equipment

Tabletop Scanning Electron Microscope (SEM), Sample Preparation- Cross Section Polisher

PVD, CVD and MVD capital equipment, providing advanced wafer processing technologies and solutions for the semiconductor and microelectronics industry. End-market applications MEMS, advanced packaging, LED, high speed RF device IC’s and power semicon.

Advanced thin film deposition and etch equipment: Atomic Layer Deposition (ALD) and Reactive Ion Etch (RIE) technologies.

Deposition: PECVD System, LSCVD® System, ALD System. Etching: Reactive Ion Etching System, ICP Etching System, Si Deep Reactive Ion Etching System, XeF2 Etching System. Surface Treatment: Aqua Plasma® Cleaner, Plasma Cleaner, UV Ozone Cleaner

Plasma assisted etch and deposition solutions. Failure analysis tools. Inspection and process control equipment.

IC decapsulation systems. Dry Etching Systems. Failure Analysis Testing System.

Solutions for plasma cleaning, plasma etching, reactive ion etching (RIE), plasma treatment, surface modification, and other facets of plasma processing.

Sputtering, Etching, Annealing and Bonding Equipment.

Plasma etching, PECVD, ALD equipment, ellipsometry and reflectometry for thin films, metrology equipment for photovoltaics.

Manufacturer of RTP tool. Distrubutor of sputter, ahser, etch and metrology systems.

Plasma-Therm produces plasma etch, deposition, and singulation tools, including ICP, RIE, DSE™, IBE, IBD, PECVD, HDPCVD, and HDRF™ F.A.S.T.™-ALD.

Etching and nanoimprinting equipment. Large area imprinter.

Etch, evaporation, sputter and PECVD process systems for wafer processing and advanced packaging

Front End fabrication equipment and vacuum equipment. Etch, CVD, PVD equipment.

Supplier of tools, process control equipment for wet-chemical etching of silicon

Innovative plasma-based solutions for ashing, descum, surface preparation, isotropic etch, photoresist curing and charge erase that are used in the fabrication of integrated circuits.