Reflectance Measurement

EUV HVM Reflectometer, EUV Accelerated Exposure Tool, Actinic Image Review System (AIRES®), EUV Pellicle Transmission Measurement System, EUV Pellicle High-Speed Mapping Tool, EUV N&K and Phase Measurement Tool, EUV Resist Outgassing Tool

Fast, nondestructive, electrical characterization tools under production conditions, measuring parameters like minority carrier lifetime, photoconductivity and resistivity.

Semiconductor front end metrology equipment: optical metrology series for film thickness & properties, and optical critical dimensions; plus X-ray metrology series for film thicknesses, material properties and compositions, surface contamination.

advanced metrology systems and analysis software to major companies in the semiconductor, optoelectronics, data storage, display, MEMS, and optical coating industries.

Optical emission instruments and software applications for endpoint detection, advanced process control, and film thickness measurement.Spectrometers, reflectometers and software.

Particle accelerators, equipment for photon instrumentation and EUV metrology, and products for fusion technology, healthcare and industry.

Wafer inspection system and in-situ process monitoring equipment.

Spectrophtometers for coaters, optical monitoring systems and software.

High-resolution, non-contact 3D measurement systems.

Four-point-probe and non-contact eddy-current measurement equipment manufacturer in resistivity and sheet resistance measurement equipment for the semiconductor and display industry.

Development and production of ALD and CVD reactors, lithography equipment, diffusion furnaces.