Dry Cleaning Equipment

Thermal LPCVD, Plasma Treatment System, Thermal ALD System, Dry Cleaning System

Central Chemical Supply System / Wet System / Inkjet Printing System for semiconductor and display

Clean room air purification, high-precision control of temperature and humidity and the reduction of fluctuations in the magnetic field. Cleaning and drying technologies for the cleaning of wafers, quartz tubes, and tools.

Cleaning systems and chemicals, contamination control for semiconductor, optics, photonics HDD assembly.

Wafer cleaning system, wafer etching system, Spin dryer, Wafer scrubber, Spray developer, Spray Echer, IPA Vapor dryer, Mask cleaner.

NEMS develops plasma technologies and provides plasma surface treatment solutions, including vacuum and atmospheric plasma machines. NEMS plasma machines can be used for surface cleaning surface etching and surface modification

Thermal Process Equipment: CVD, Diffusion, Oxidation, Annealing.

Deposition: PECVD System, LSCVD® System, ALD System. Etching: Reactive Ion Etching System, ICP Etching System, Si Deep Reactive Ion Etching System, XeF2 Etching System. Surface Treatment: Aqua Plasma® Cleaner, Plasma Cleaner, UV Ozone Cleaner

Vacuum gate valve, plasma cleaning system, Etching & Ashing system and gas purifier & PSA system in semiconductor and FPD industry.

Precise surface processing equipment based on advanced ion beam and plasma technologies. The systems are applicable for coating, etching, and cleaning processes, especially for the MEMS, microelectronics, and precision optics industries.

Air substrate cleanr for glass substrate devices (FPD, OLED, TFT), film substrate device, wafer etc

Wafer Fabrication Equipment: Dry strip, dry cleaning, new hard mask strip system, edge clean system. 3D IC Packaging Equipment: plasma surface treatment, reflow system, hot DI system, plasma source

Cleaning solutions for ceramic substrates, PCB, stencils. machine parts. Cleaning systems, detergents and cleaning services.

Cleaning and purifying MOVPE equipment susceptors, many years of experience in the removal of III-V materials and nitrides using dry proprietary gasses in bespoke high temperature furnaces.

Semiconductor front end and WLP packaging equipment manufacturer.