With over 30 years of semiconductor experience with different technology, process and customised systems installed in wide industries like Semiconductor wafer fab, R&D, University and special process Tarius Technology provide a wide range of application. Tarius Technology’s customise solutions provide flexibility, durability and lowest COO to the customer.
Product Portfolio
Production Grade Furnace Processing Systems
Research Grade Furnace Processing Systems
VSF – Vacuum Sintering Furnace Systems
Source Cabinets and Source/Vacuum Pump Cabinets
Load Stations and Loading Systems
Vacuum Systems
LPCVD and Diffusion Retrofits and Components
Diffusion and LPCVD Gas and Liquid Source Delivery Systems
Specialized and Custom Gas Systems
ASTRA Control System
Diffusion and Oxidation Processes
Dry oxidation
Dry oxidation with HCl enhancement
Dry oxidation with DCE enhancement
Pyrogenic oxidation, internal torch
Pyrogenic oxidation, external torch
Pyrogenic oxidation with HCl enhancement
Pyrogenic oxidation with DCE enhancement
Wet oxidation with DI:H2O steamer
DI:H2O bubbler oxidation
POCl3 phos dep liquid source doping
BBr3 boron dep liquid source doping
Solid source doping
H2 anneal/alloy
Forming gas anneal/alloy/sinter
Vacuum, inert gas or noble gas anneal/alloy/sinter
High Temp Anneal
LPCVD Processes
Intrinsic Polysilicon
Amorphous Silicon
Insitu doped phos polysilicon
SiPOS (oxygen doped polysilicon)
Silicon Nitride (Si3N4)
Low stress silicon nitride
Low Pressure POCl3 phos dep liquid source doping
Oxynitride
HTO
LTO
PSG
BPSG
TEOS
Doped TEOS
Committed fully to customer satisfaction
Provide innovation, quality and reliability
Maintain accurate process performance and the highest uptime
Develop and maintain long-term customer relationships
Attend to and maintain effective cost-of-ownership
