Solvent stations are used in semiconductor fabrication process to clean and remove contaminants from the surface of wafers. They contain tanks filled with different solvents that are used in specific stages of the cleaning process. The solvents used can be organic or inorganic and are chosen based on the type of contaminant to be removed. The wafers are immersed in the solvent tanks, agitated and then rinsed with deionized water to remove the residual solvent and contaminants. This step is critical in ensuring the cleanliness of the wafers and maintaining the desired electrical properties of the final product.
Solvent stations for semiconductor processes typically have the following peculiarities:
High purity requirement: Solvents used in semiconductor processes must be of high purity to prevent contamination of the wafers during the cleaning process.
Controlled dispensing: Solvents must be dispensed in a controlled and consistent manner to ensure uniform cleaning and prevent overuse or waste.
Solvent recovery: Many solvent stations are equipped with systems for recovering and reusing solvents to reduce cost and minimize waste.
Safety features: Solvents used in semiconductor processes can be flammable, toxic, or volatile, and solvent stations must have appropriate safety features to prevent accidents and protect workers.
Compliance with regulations: Solvent stations must comply with regulations related to the handling and disposal of hazardous materials and waste.