In an interview, Lu Donghui, the chairman of Micron Taiwan, discussed various aspects of Micron's operations and their plans for the future. Donghui highlighted that around 65% of Micron's DRAM products are produced in Taiwan, emphasizing the importance of Taiwan and Japan as manufacturing centers for the company. He mentioned the joint efforts of the Taiwan-Japan team in developing a new generation of 1-gamma process, which will utilize extreme ultraviolet (EUV) process technology. This marks Micron's first-generation use of EUV technology and is set to be mass-produced at the Taichung plant in the first half of 2025.

Donghui acknowledged the recent challenges in the memory business and the economic uncertainties caused by events like the pandemic and the Russia-Ukraine war. However, he expressed confidence in Micron's ability to effectively navigate these crises by being well-prepared and adaptable. He mentioned that Micron was the first to warn about the correction in the semiconductor economy and positioned themselves advantageously compared to their competitors.

Regarding market conditions, Donghui stated that although the semiconductor industry as a whole has yet to recover and Micron's production capacity is not fully utilized, the demand for DDR5 and high-bandwidth memory (HBM) is growing consistently. He highlighted the popularity of Micron's HBM3 and DDR5 products in the e-sports and generative AI application markets. Micron is actively adjusting its annual business plan to align with these positive market trends.

Furthermore, Donghui emphasized the significance of Taiwan and Japan in Micron's manufacturing operations. Apart from the current mass production of the 1-beta process in Taiwan, he mentioned ongoing collaborative efforts with Japanese teams to develop the next-generation 1-gamma process. This process will utilize EUV technology and is expected to achieve mass production by the first half of 2025. Donghui stressed that the Taichung plant will be the primary location for mass production of the 1-gamma process, with the Japanese plant planning to import EUV equipment in the future.

Donghui acknowledged that multiple generations of EUV technology, such as the 1-delta process, will continue to be employed after the 1-gamma process. He suggested that it is currently uncertain when the DRAM process will further shrink, asserting that it is a question to which no one has an answer yet.

Reflecting on the progress of technology, Donghui recalled how some people believed logic circuits would reach their limits after 65 nanometers when he joined Intel in 2000. However, he commented on the remarkable nature of human innovation and highlighted the possibilities that lie ahead. Donghui mentioned that there is still room for further advancements, including the potential conversion of DRAM to 3D DRAM.

Lu Donghui, chairman of Micron Taiwan, discussed Micron's production operations in Taiwan, their preparations for economic corrections, and their focus on DDR5 and HBM products. He also highlighted the collaborative efforts between Taiwan and Japan in developing advanced process technologies, including the 1-gamma process utilizing EUV technology. Donghui expressed optimism about Micron's prospects and underscored the continuous potential for innovation in the semiconductor industry.