Next-Generation Lithography for Photomask Clean, Bake and Develop
MaskTrack Pro solves next-generation lithography roadmap requirements for photomask cleaning, bake and developing. MaskTrack Pro is designed to balance the most stringent conditions of 193i 1x nm half-pitch (hp) DPT, extreme-ultraviolet lithography (EUVL) and nanomprint lithography (NIL) processing with innovative techniques to maximize mask performance.
With mask integrity playing a greater part in the success of advanced lithographic processing, MaskTrack Pro is the only platform that is specifically designed in respect to EUVL. It is extendable to allow tool clustering with third-party products for a holistic approach to storage, handling and processing of the mask in a fully-controlled and ultra-clean environment. Its modular platform guarantees maximum flexibility and customization. With its highest first pass cleaning yield, MaskTrack Pro has been accepted as the platform of choice in the industry.
Configuration: 193i / EUVL Photomask Cleaning System
MaskTrack Pro offers a unique combination of physical and chemical cleaning technologies and methods for surface preparation and passivation that enable customers to effectively remove particles, organic and inorganic contamination while preserving mask integrity down to 1x nm hp technology node. MaskTrack Pro is backward compatible to 90 nm hp.
Wet Cleaning
Surface Treatment
Process Automation
Standards
Physical-based Cleaning
Offering multiple physical force technologies for wet cleaning the system consists of up to three pre-clean and final-clean chambers for segregation of strip, pre-clean and final clean processes.
Unique in-situ UV surface preparation and cleaning technology
High frequency dual megasonic cleaning up to 4MHz
Precision nano binary spray
Focus Spot Cleaning
Chemical-based Cleaning
DIW-H20 degassing for cavitation control during megasonic process
Ultra-clean hot and cold CO2-DI water
Ozonated DI water and electrolyzed H2 incl. pH stabilization
Ultra-diluted SC1
New alkaline-based media for further pattern damage reduction
15 nm process media filtration
Configuration: Single Chamber Photomask Backside Cleaning System
MaskTrack Pro is configurable as an automated sulphate-free photomask cleaning system specifically designed for cleaning of pellicallized masks for advanced technology nodes.
Wet Cleaning
Process Automation
Standards
Physical-based Cleaning
Single substrate final clean process chamber
Special backside cleaning chuck enabling fully mask
frontside and pellicle protection from process chemicals
Megasonic cleaning
Nano Binary Spray
Spin dry
Chemical-based Cleaning
DIW-H20 degassing for cavitation control during megasonic process
Ultra-clean hot and cold CO2-DI water
Ozonated DI water and electrolyzed H2 incl. pH stabilization
Ultra-diluted SC1
New alkaline-based media for further pattern damage reduction
15 nm process media filtration
Configuration: InSync EUVL Photomask Management System
The MaskTrack Pro InSync system offers a specific solution for a holistic mask management in an EUVL environment. As an interface between the MaskTrack Pro cleaning tool and the EUV scanner, it enables automation of the EUV dual pod system. Providing an extremely high intrinsic cleanliness on environment and handling, it ensures a safe and contamination free transfer of the EUV mask the compatibility to the high sensitive vacuum environment of the EUV scanner. The innovative design allows inner pod stocking and backside particle detection with a third-party systems clustering.
Product Features
Standards
Innovative Design
EUV Dual Pod compatibility
Inner Pod (EIP) automation (opening/closing, storage)
Interface to MaskTrack Pro cleaning system
Backside inspection metrology capability including advanced defect data analysis
software with close loop feedback control to address mask re-cleaning
Functional as a stand-alone unit or clustering to MaskTrack Pro cleaning system
Accepts standard SMIF boxes for transfer to/from SMIF to EUV dual pod
Reading functionality of the EUV mask’s 2D QR code
Configuration: Photomask Bake and Develop System
The MaskTrack Pro Bake/Develop system is part of SUSS MicroTec's holistic mask product series for next-generation lithography. Designed for challenges of sub-32nm lithography the system enables most complex photomask manufacturing.
Developing
Post-Exposure Bake
Process Automation
Standards
State-of-the-Art Technologies
A+nozzle low impact dispense technology for fast and uniform surface wetting and media exchange (→ defect performance and CD uniformity control)
ASONIC-Technology® using acoustic streaming for efficient developer utilization compensating pattern loading non-uniformity (→ CD uniformity control)
Configuration: TeraPure Imprint Template Cleaning System
TeraPure, MaskTrack Pro’s specific system for imprint templates, is proven cleaning technology and SUSS’s industry-recognized highest first-pass cleaning yield. The modular design offers customers the flexibility needed for dynamic and developing technologies, such as nanoimprint lithography (NIL).
Wet Cleaning
Surface Preparation
Process Automation
Standards
Physical-based Cleaning
The system consists of two separate cleaning chambers for segregation of strip/ pre-clean and final clean processes, alternatively assignment of one chamber for master template cleaning and the other for replica cleaning. The wet process is conveniently monitored via online webcam.
Unique in-situ UV surface preparation and cleaning technology
High frequency dual megasonic cleaning up to 4MHz
Precision nano binary spray
Chemical-based Cleaning
DIW-H20 degassing for cavitation control during megasonic process
Ultra-clean hot and cold CO2-DI water
Ozonated DI water and electrolyzed H2 incl. pH stabilization
Ultra-diluted SC1
New alkaline-based media for further pattern damage reduction
15 nm process media filtration
