RASIRC products generate and deliver reactive gases for thin film deposition processes. Each unit generates gas phase reactive chemistry in situ from formulated chemical solutions for atomic level processing. RASIRC technology delivers hydrogen peroxide gas and hydrazine gas in controlled, repeatable concentrations.
Ultra-Dry Hydrogen Peroxide Gas for Low Temperature Oxides
BRUTE Peroxide is an excellent oxidant source for low temperature ALD needed in next generation devices.
Ultra-Dry Hydrazine Gas for Low Temperature Nitrides
BRUTE Hydrazine is an excellent, highly reactive nitride source for low temperature ALD needed in next generation processors and memory.
High Volume, High Concentration Hydrogen Peroxide Gas
The Peroxidizer is an excellent oxide source for low temperature ALD and ASD needed in next generation semiconductor devices.
Droplet-Free Water Vapor for ALD and Oxidation
The RainMaker Humidification System (RHS) is a precisely controlled oxide source for droplet-free deposition.