Reno’s RF power products address critical customer needs of technology enablement, precision and unmatched repeatability. To equipment OEMs, Reno’s RF sub-systems products provide systematic and differentiating performance enhancements to standard deposition and etch tools without the need for costly tool redesign.
For device manufacturers, Reno’s products promise an order-of-magnitude improvement in process control to enable manufacturing of leading-edge devices.
Reno’s two enabling patented technologies open the plasma processing door to deep submicron feature sizes and the very short process times necessary for both planar and 3D device architectures. In addition to new process regimes, Reno’s process control technologies facilitate “always on” plasma management, reducing on-wafer particles, improving film properties and reducing cost per transistor, thereby enabling Moore’s law.
Velocity™ EVC™ Matching Networks
Reno’s patented Electronically Variable Capacitor (EVC™) matching network provides an all-solid state, highly reliable and repeatable matching solution with sub-500 microsecond tune times every wafer every time.
Precis™ RF Power Generators
Reno’s patented Precis™ solid-state RF power generators deliver accurate and stable power delivery, fast pulsing for shorter process steps, and a compact design for space savings.
GenMatch™ Series
The GenMatch™ Series integrates Reno’s proven solid-state Electronic Variable Capacitor (EVC™) RF match and Precis™ generator technologies into a single unit to meet performance and space requirements at the most advanced nodes.
