Etesian was founded at the beginning of 2008 as a rep company for TowerJazz. Since then we’ve expanded our offering and became a growing company that is recognized for its capabilities to support high complexity semiconductors products in various stages of the product life cycle.

Focusing on CMOS Image sensors and specialty process design and development, Etesian Semiconductor provides unique integration between customers’ needs and manufacturers’ capabilities. Through our Boutique Foundry support model, offered to our customers, we assume full responsibility for managing their programs throughout the various stages of development, qualification and production.

We offer program management and customized solutions for high-complexity semiconductors products with low to medium volume production, targeting professional markets such as medical, scientific, industrial, aerospace, homeland security and other high-end applications. Among our clients one can find leading product companies, design houses, research institutes and universities.

We support additional stages when needed for product development and production, including customized process and device design, tailored silicon substrates, wafer testing, assembly and final test, for which we have established partnership with key industry vendors.

We offer program management and customized solutions for high-complexity products with low to medium volume production, targeting professional markets such as medical, scientific, industrial, aerospace, and other high-end applications. Among our clients one can find leading product companies, design houses, research institutes and universities.

 

We support additional stages when needed for product development and production, including tailored silicon substrates, wafer testing, assembly and final test, for which we have established partnership with key industry vendors.

 

Our highly experienced team is very well connected with key functions within the organizations of our partners, allowing us to drive for focused and fast execution of our customers’ programs assuring improved performance in shorter cycle times.

 

Our highly experienced team is very well connected with key functions within the organizations of our partners, allowing us to drive for focused and fast execution of our customers’ programs assuring improved performance in shorter cycle times.

 

The name of our company, ETesiAN, comes from the Aegean sea wind that blows in hot summer days; This wind has been described since ancient timesand is by far the most preferred weather type and is considered a blessing. As our name hints, we aim to bring a fresh wind to the semiconductor industry by providing the best service for those companies interested in IP, foundry, manufacturing and design services with high quality standards for many years.

CMOS Image Sensor (CIS)
Our TS11IS hybrid CMOS image sensor (CIS) process offering, a combination of 0.11μm and 0.16μm platform allows customers to design higher resolution high-end sensors with smaller pixels and enhanced performance. The process is targeted for applications in high end photography, machine vision, 3D imaging and security sensors. According to Yole Development, the forecast for high-end CMOS image sensors is expected to be ~$2B in 2015 with a CAGR of 13%. The new platform ideally serves our customers’ needs for the professional CIS markets, allowing them to create new business opportunities, expand the span of applications accessible for their designs, and enlarge their market share. Based on Tower’s 0.16μm CMOS shrink process, it allows easy re-use of existing customers’ 0.18μm circuit IP which will save them from investing in resources to redesign existing blocks, and increases the probability for first time success. The TS11IS offers improved pixel performance, smaller pixel pitch, higher resolution, improved sensitivity, and improved angular response. It allows up to 50% reduction of pixel size, mainly for high-end global shutter pixels. The platform includes a new local interconnect layer to allow denser metallization routing in pixels while maintaining good QE (quantum efficiency). It also includes tighter design rules for all metal layers and implant layers as well as provides a “Bathtub” option for lower stack height, improving the sensors’ angular response.


Micro-Electro-Mechanical Systems (MEMS)
We provide world-class “Foundry MEMS Enablement“ solutions combined with high volume 150mm and 200mm CMOS wafer manufacturing. We integrate custom MEMS with our specialty processes to address complex wireless and consumer electronics markets. We are focused on a collaborative partnership model and apply our foundry experience, silicon MEMS processes and customer oriented team to enable the successful and rapid implementation of both 150mm and 200mm MEMS manufacturing, including both prototype and ramp to volume production. Our customers' applications span the fields of consumer, medical and high-end navigation products. We continue to augment our portfolio of specialty silicon technology adding MEMS manufacturing to our existing suite of analog and RF CMOS, high speed SiGe, and high voltage technology enhancing the ability of our customers to create and bring to market more highly integrated analog products.

 

 

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