AOI mask inspection tool provider, committed to the development, design, fabrication, and sales of high-end AOI tools required during the beginning stages of semiconductor fabrication.
UNICORN-640 Series
Features：
Applicable to Mask Inspections for 45 nm – 7 nm nodes.
Pin-Hole inspection.
Particle inspection for Inner Frame and Pellicle Side.
Uses dedicated algorithm to analyze Particle on / under Pellicle.
High-precision defect location inspection.
◎ Application：
OQC at Mask Shops.
For Pellicle Manufacturers.
UNICORN-620N Series
Features：
Applicable to Mask Inspections for 28 nm – 5 nm nodes.
SMIF POD does not have to be turned on when inspecting, so there are no secondary pollution concerns.
Real time dust monitoring for Blank / ADI / AEI process at Mask Shop.
Real time dust monitoring on the Backside / Blank of EUV Mask.
High-precision defect location inspection.
◎ Application：
Processing inspections at Mask Shops.
For Mask Blank Manufacturers.
UNICORN-640E Pro Series
Features：
Applicable to EUV Mask inspections.
Particle inspection for Pattern Side and Pellicle Side.
Uses dedicated algorithm to analyze Particle on / under Pellicle.
High-precision defect location inspection.
◎ Application：
EUV Mask OQC at Mask Shops.
For Pellicle Manufacturers.
UNICORN-660 Series
Features：
Applicable to Mask inspections for 45 nm – 16 nm nodes.
Instant defect inspection on the surface of Pellicle and the Backside of Mask.
Compatible with OHT to carry out fully automatic mask inspections.
High-precision defect location inspection.
◎ Application：
IQC Inspection at Foundries.
Routine Inspection at Foundries.
For Pellicle Manufacturers.
