AOI mask inspection tool provider, committed to the development, design, fabrication, and sales of high-end AOI tools required during the beginning stages of semiconductor fabrication.

UNICORN-640 Series

Features:
Applicable to Mask Inspections for 45 nm – 7 nm nodes.
Pin-Hole inspection.
Particle inspection for Inner Frame and Pellicle Side.
Uses dedicated algorithm to analyze Particle on / under Pellicle.
High-precision defect location inspection.
◎ Application:
OQC at Mask Shops.
For Pellicle Manufacturers.


UNICORN-620N Series

Features:
Applicable to Mask Inspections for 28 nm – 5 nm nodes.
SMIF POD does not have to be turned on when inspecting, so there are no secondary pollution concerns.
Real time dust monitoring for Blank / ADI / AEI process at Mask Shop.
Real time dust monitoring on the Backside / Blank of EUV Mask.
High-precision defect location inspection.
◎ Application:
Processing inspections at Mask Shops.
For Mask Blank Manufacturers.


UNICORN-640E Pro Series

Features:
Applicable to EUV Mask inspections.
Particle inspection for Pattern Side and Pellicle Side.
Uses dedicated algorithm to analyze Particle on / under Pellicle.
High-precision defect location inspection.
◎ Application:
EUV Mask OQC at Mask Shops.
For Pellicle Manufacturers.

UNICORN-660 Series

Features:
Applicable to Mask inspections for 45 nm – 16 nm nodes.
Instant defect inspection on the surface of Pellicle and the Backside of Mask.
Compatible with OHT to carry out fully automatic mask inspections.
High-precision defect location inspection.
◎ Application:
IQC Inspection at Foundries.
Routine Inspection at Foundries.
For Pellicle Manufacturers.

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