ADAS
Automatic Defect Analysis System
Fast and Accurate Photomask Defect Classification and Simulation
Reliable Pass/Fail mask and defect dispositioning
Simulates defect impact on wafer
Processes more than 1,000 defects per minute
Early detection of progressive defects
Photomask defect classification is time consuming, costly, and prone to occasional human errors causing millions of dollars in lost wafers every year.
ADAS accurately automates defect classification and measurement, increasing throughout and dramatically reducing the risk of missed yield-limiting defects printing on wafers. ADAS is compatible with all mask inspection tool manufacturers including Lasertec, KLA-Tencor, Applied Materials, and NuFlare.
Reliable Defect and Mask Dispositioning
Leading semiconductor customers have trusted ADAS for more than 6 years
-ADAS is the only commercial automatic defect classification system in wafer fab production with no known misclassified critical defects
Pass/Fail criteria is determined in part by:
Defect size
Defect location and proximity to edges
Pattern type
Percentage error of customer specification
Transmission properties
Reflection properties
And many more...
Automatic Defect Printability Simulation
Defect printability analysis
A question constantly asked in wafer fabs is, "Will this defect print?" Such uncertainty causes production masks to be put on hold for hours or days while expensive print checks are performed.
—In order to assist in predicting defect printability, ADAS incorporates an aerial image simulator which greatly reduces the risk of yield limiting defects entering wafer production
ADAS' patented printability simulator provides:
Predicted defect CD error as a percentage of nominal CD
Aerial transmission error measurement
Compatible with all illumination sources including free form
Fast Restults
Processes more than 1,000 defects per minute!
Critical mask inspection are run at high sensitivity to ensure detection of all defects. These aggressive settings can produce very high defect counts, greatly increasing the risk of misclassification and long mask hold times.
—ADAS analyzes over 1,000 defects per minute allowing inspection tools to be run at high sensitivity ensuring detection of all critical defects without decreasing inspection area efficiency
Early Detection of Haze
Monitor defect growth and adders
High exposure in ArF scanners frequently leads to haze defects which can rapidly kill wafer yields.
—ADAS automatically provides early detection of these growths by comparing defect locations and sizes to past inspections, easily identifying changes to the photomask
Analysis tools provide:
CD and CD error measurement
Defect cluster analysis
Defect distribution by type & size
Combine multiple inspections; adder detection
