Prototyping, Fabrication Products

WET is a professional etching processing company, we can achieve a perfect etching tolerance of ±0.005mm. For stainless steel, copper, nickel, etc.

Wafer box, wafer carrier, wafer cassette, wafer carrier handle, RSP (reticle SMIF pod), RSP opener, mask case, chip tray, fluoro valves, cleanroom supplies, wafer and cassette cleaning systems

One stop R&D for device construction proposal, design, process proposal, prototype building, reliability testing, and volume production

Photonic Integration Consultancy, PIC Design, PIC Manufacturing, Characterization and testing services at wafer and chip (DIE) levels, PIC Packaging, Foundry Process Design Kits, PIC Design and Characterization

Tabletop Scanning Electron Microscope (SEM), Sample Preparation- Cross Section Polisher

on-demand atomic layer advanced manufacturing technology based on hybrid Microreactor Selective Area Direct Atomic Processing.

Open-access Photonic Integrated Circuit (PIC) Assembly and Packaging Pilot line

π-Fab - Prototype Fabrication, SiC-Services, Failure Analysis, Trouble Shooting in Power Electronics, Equipment and processes for the production of crystalline bulk and layer materials for electronics, comprising silicon, wide-band-gap semiconductors.

IC decapsulation systems. Dry Etching Systems. Failure Analysis Testing System.

Microscopy: TEM, SEM, Ion Beam millling and imaging, ion slicer, electrone probe microanalyzer, Auger microprobe, specrometers, EB lithography system, additive manufacturing,

Etch, evaporation, sputter and PECVD process systems for wafer processing and advanced packaging

Supplier of critical surface preparation materials.

Clean Room: Static Control, Storage Units, Cleaning Equipment. Process Equipment: Wet Etch Systems, Diffusion/Oxidation/Annealing, Developing.

Innovative plasma-based solutions for ashing, descum, surface preparation, isotropic etch, photoresist curing and charge erase that are used in the fabrication of integrated circuits.

Original equipment manufacturer of plasma etch (reactive ion etch), photoresist strip/ash/descum, and plasma enhanced chemical vapor deposition tools for the compound semiconductor, MEMS, opto-electronic and other markets