Monocrystalline silicon manufacturing equipment
Toyo Tanso provides a range of graphite products for use as parts in monocrystalline silicon processes (CZ furnaces). We are also able to supply large-diameter products and long-life surface-treated products.
Monocrystalline silicon manufacturing equipment
When pulling monocrystalline silicon, melting temperature is extremely high at approximately 1500°C, but isotropic graphite's excellent thermal durability helps extend product life.
High-purity products are used in environments where it is necessary to avoid contaminants; coating products (PERMA KOTE® and PYROGRAPH®) are used in environments where it is necessary to avoid particles and reactions with desorbed gas and SiO gas; and lightweight, easy-to-handle C/C composites are used in large furnaces.
Products
Crucible
To protect the quartz crucible used in the manufacture of single crystal silicon, many manufacturers are using our high purified isotropic graphite as it provides high strength and minimal wear.
Heater
Graphite can be purified down to the ppm order as well as easily machined to complicated forms. It is an absolutely necessary material for the heating elements used in semiconductor manufacture.
Features
Excellent thermal durability
Excellent thermal conductivity
High density
High strength
Lightweight
Little variation in characteristics enables stable use
Ultra-high-purity treatment possible
Silicon Epitaxial Growth
Due to their excellent chemical resistance, dust resistance, and dimensional precision, Toyo Tanso's PERMA KOTE™ products are widely used in epitaxial wafer manufacturing processes.
Silicon Epitaxial Growth
In the epitaxial process, silicon wafers are heated in an epitaxial furnace to around 1200°C, and vaporized silicon tetrachloride (SiCl4) and silane trichloride (SiHCl3) are added to the furnace to induce epitaxial growth on the surface of the wafers.
PERMA KOTE™ susceptors (SiC coated)--which have excellent thermal durability, chemical resistance, and dust resistance--are therefore extensively employed.
Moreover, because susceptors come into contact with the wafers, their dimensional precision and surface roughness affect wafer temperature distribution. SiC layers with high dimensional precision and smoothness are therefore required.
Thanks to proprietary technology for graphite substrate processing and SiC layer control combined with technical support that leverages our superb analytic capabilities, Toyo Tanso can offer the ideal product to suit your requirements.
Features
Excellent thermal durability
Excellent dimension accuracy
Excellent dust resistance
Excellent oxidation resistance
Superior sealing properties
Compound semiconductor
Thanks to their excellent chemical resistance, dust resistance, and dimensional precision, PERMA KOTE™ products are widely used in LED manufacturing processes.
Compound semiconductor
The MOCVD process involves the use of ammonia (NH3) gas, which makes it impossible to avoid early corrosion when using non-coated graphite, and also requires a high-purity, dust-proof environment. PERMA KOTE™ susceptors (SiC coated) are therefore widely employed for their excellent thermal durability and chemical- and dust-resistant properties.
Moreover, because susceptors come into contact with the wafers, their dimensional precision and surface roughness affect wafer temperature distribution. SiC layers with high dimensional precision and smoothness are therefore required.
Thanks to proprietary technology for graphite substrate processing and SiC layer control combined with technical support that leverages our superb analytic capabilities, Toyo Tanso can offer the ideal product to suit your requirements.
Moreover, because susceptors come into contact with the wafers, their dimensional precision and surface roughness affect wafer temperature distribution. SiC layers with high dimensional precision and smoothness are therefore required.
Thanks to proprietary technology for graphite substrate processing and SiC layer control combined with technical support that leverages our superb analytic capabilities, Toyo Tanso can offer the ideal product to suit your requirements.
Features
Excellent thermal durability
Excellent dimension accuracy
Excellent dust resistance
Excellent oxidation resistance
Superior sealing properties
polycrystalline silicon manufacturing equipment
Toyo Tanso can propose the ideal material and shape from a variety of graphite materials to respond to requests for larger equipment sizes, performance enhancements, and other changes to polycrystalline silicon manufacturing equipment.
polycrystalline silicon manufacturing equipment
Our graphite products are widely used in the polycrystalline silicon manufacturing process--one of the processes used to manufacture the photovoltaic cells in solar panels.
When manufacturing the silicon ingots used to form these photovoltaic cells, the melting temperature is extremely high at approximately 1,500°C. Isotropic graphite--which has excellent thermal durability--is therefore extensively employed in rectangular crucibles, heaters, protective covers for insulation, and other components used in casting furnaces.
Larger ingot sizes are also being developed with the aim of improving production efficiency and reducing costs.
To respond to such size increases, we can design lighter furnaces using isotropic graphite materials and C/C composites, and can also propose optimal shapes to extend product life using our analytical technologies.
Features
Excellent Thermal Durability
Highly reliable material with a small characteristic variation
High Electrical Resistance
Light Weight
High-Strength
high-purity polysilicon manufacturing
Toyo Tanso can supply the ideal material to match usage conditions and degree of purity in high-purity polysilicon manufacturing.
high-purity polysilicon manufacturing
Our ultra-high-purity graphite products are extensively used in reactors and converters in the manufacturing process for high-purity polysilicon, the raw material of the silicon wafers used in semiconductors and photovoltaic cells.
Graphite's high purity and excellent electrical conductivity are used to advantage in seed chucks, which come into direct contact with the silicon seed, and components for use in furnace interiors.
We supply a wide range of grades and can select the ideal material to match a variety of requests such as those for quality improvements and cost reductions.
Features
Excellent Electrical Conductivity
Excellent Thermal Durability
Excellent Chemical Resistance
High purified products is available
