Pure Gas

 

ItemsPurityPackageCharge AmountApplied Processes
CylinderValve
NO3N5, 4N (99.95%, 99.99%)47LJISS22R490psi, 290psiDeposition
CF₄5N (99.999%)47L, 440LDISS716, JISS22R30kg, 32kg, 300kgCleaning and Etching
HBr5N, 5N5 (99.999%, 99.9995%)47LCGA330, DISS63450kg, 55kgEtching
Si₂H₆4N8 (99.998%)47LJISS22L, DISS6325kg, 10kg, 20kgDeposition
C3F85N (99.999%)47LJISS22R40kgCleaning and Etching
He5N, 6N (99.999%, 99.9999%)47L, BundleCGA 580, JISS22R130Bar, 170BarCarrier and Purge

 

 

 

Mix Gas

 

ItemsPurityPackageCharge AmountApplied Processes
CylinderValve
Excimer Laser1.25% Kr
3.5%Ar/10ppmXe
47LJISS22R, CGA580, CGA679135kg/cm2Photo Lithography
1% F₂ / 1.25% Kr
1% F₂ / 3.5% Ar
135kg/cm2Photo Lithography
PH₃ Mix20ppm ~ 50% PH₃ Mixture47LCGA350100 ~ 120kg/cm2Doping
Inert Mix3% H₂ & 1.2% He Mixture47LDISS724, JISS22R110 ~ 120kg/cm2Photo Lithography and others
SiH₄ Mix10ppm ~ 50% SiH₄ Mixture47LJISS22L, CGA350100 ~ 120kg/cm2LED Deposition
Si₂H₆ Mix100ppm ~ 50% Si₂H₆ Mixture47LCGA350120kg/cm2LED Deposition
F₂ Mix1% ~ 20% F₂ Mixture47LCGA679110 ~ 120kg/cm2Cleaning
AsH₃ Mix15% AsH₃ Mixture-CGA350400psiDoping
GeH4 Mix10% GeH4 Mixture47LDISS6321800psiDeposition

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