was founded in 1944 as a reagent company,
currently it produces many kinds of chemical products
such as electronic materials, medicines, and general chemicals.
Especially, the company has strong strength in high purity products for semiconductor manufacturing.
KANTO CHEMICAL was founded in 1944 as a reagent company.
Afterward, the company expanded its business into various chemicals.
In 1964, the company started to sell high purity materials for the semiconductor manufacturing process.Not only semiconductors, but display industries are also using Kanto chemical's ultra high purity products such as high-functionality Ecthing solutions, cleaning solutions, and stripping solutions.
Functional Chemicals
Post CMP cleaner
Post CMP cleaning solution for Cu-CMP, W-CMP, Co-CMP, ILD-CMP.
Etchant
Etching solution for Au, Ag, Cu, Ru, Al, ITO, Si, Metal oxide semiconductor, piezoelectric film and stacked film.
There are other etchant for various metals besides the items listed in above.
Dry etching residuals remover
Post dry etching cleaning solution for Al process and Cu/low-k process.
Resist Stripper and Developer
Stripping solution and develpoer for Posi/Nega type resist.
Acid/Alkaline
Acetic Acid
Hydrochloric Acid
Hydrofluoric Acid
Nitric Acid
Phosphoric Acid
Sulfuric Acid
Hydrogen Peroxide
Ammonium Fluoride aq. Solution
Citric Acid aq. Solution
Tartaric Acid aq. Solution
Perchloric Acid
Sodium Hydroxide aq. Solution (NaOH)
Potassium Hydroxide aq. Solution (KOH)
48% KOH Low metal (KOHLM)
Tetramethylammonium Hydroxide aq. Solution (TMAH-22 / TMAH-25)
50% Cerium(IV) Diammonium Nitrate aq. Solution
Solvents
Acetone
2-Butanone (MEK)
n-Butyl Acetate
Ethanol (99.5%)
Denaturated Ethanol
Ethyl Acetate
Isopentyl Acetate
Methanol
4-Methyl-2-Pentanone (MIBK)
2-Propanol (IPA)
Toluene
Xylene
Cyclohexanone
2-Ethoxyethyl Acetate
Propylene Glycol Methyl Ether Acetate (PGMEA)
N-Methyl-2-Pyrrolidinone (NMP)
EL-GBL (γ-Butyrolactone)
