PTW is a global supplier of choice for upkeep and capacity extensions for used Semiconductor Equipment. PTW is established in 2007, headquartered in Singapore, with branch offices and sales offices in Austria, Germany, Philippines, Malaysia, America, China, Taiwan, Korea, Japan, and Vietnam. Today, PTW has 69 employees worldwide.
Production is done on our center in:
- Bad Bleiberg Austria for Suess and SEZ
- Angeles Philippines for Semitool
- Taichung Taiwan for ASM
- Singapore for Hitachi CDSem and FEI FIB/TEM
Overview of Products and Services by brands:
- SEZ
- Suess Microtec Coater and Developer
- Semitool Raider, Spectrum and Storm
- ASM Epi, Furnace and PECVD/PEALD
- Hitachi CDSem and FASem
- FEI / Thermofisher
- Core Tool Trading
- MKS and in USA Ozone generator refurb/overhaul
- Through Partners we can offer depending on region
- AMAT Epi Centura
- Nikon Stepper and Scanner
- AMAT SemVision
- CVD-PVD Heater and Chuck refurb
Our Latest Tools for Sale
|
Brand |
Model |
Description |
Serial Number |
Wafersize |
Year of Manufacture |
Location |
|
Applied Materials |
Centura CVD |
Plasma, CVD |
21279 |
8 |
2008 |
Dresden |
|
AMAT / Applied Materials |
Centura HTF |
WCVD Cluster 2 Chambers |
319567 |
8 |
2000 |
Dresden |
|
AMAT / Applied Materials |
P5000 |
PECVD Nitrid |
5706 |
6 |
Dresden |
|
|
AMAT / Applied Materials |
P5000 |
PECVD Oxide |
6477 |
6 |
Dresden |
|
|
AMAT / Applied Materials |
P5000 |
PECVD Nitrid |
4106 |
6 |
Dresden |
|
|
LAM Research |
Rainbow 4420B |
Poly-Nitrid Single Plasma-Etcher |
2500 |
6 |
Dresden |
|
|
LAM Research |
Rainbow 4420B |
Poly-Nitrid Single Plasma-Etcher |
2923 |
6 |
Dresden |
|
|
LAM Research |
Rainbow 4420 |
Poly-Nitrid Single Plasma-Etcher |
3421 |
6 |
Dresden |
|
|
KLA Tencor |
P11 Surface Profiler |
04970190 |
Dresden |
|||
|
Tegal |
OEM981 |
Etch |
8 |
Dresden |
||
|
PVA TePLA |
300 AL PC |
Photoresist stripping, Surface cleaning… |
1479 |
6 |
2004 |
Dresden |
|
PVA TePLA |
300 AL PC |
Photoresist stripping, Surface cleaning… |
1480 |
6 |
2004 |
Dresden |
|
SEZ |
RST-101 |
1 Chamber |
0247 |
6 |
1997 |
Korea |
|
SEZ |
203 |
1 Chamber |
1157 |
4, 5, 6, 8 |
1999 |
Austria |
|
SEZ |
223 |
2 Chamber |
919 |
4, 5, 6, 8 |
2004 |
Austria |
|
SEZ |
304 |
1 Chamber |
438 |
8, 12 |
Austria |
|
|
SEZ |
305 |
1 Chamber |
1032 |
8, 12 |
2006 |
Austria |
|
SEZ |
323 |
2 Chambers |
605 |
8, 12 |
2002 |
Austria |
|
SEZ |
323 |
2 Chambers |
623 |
8, 12 |
Austria |
|
|
SEZ |
323 |
2 Chambers |
00988 |
8, 12 |
2005 |
Austria |
|
SEZ |
323 |
2 Chambers |
01066 |
8, 12 |
2006 |
Austria |
|
SEZ |
323 |
2 Chambers |
0703 |
8, 12 |
2003 |
Austria |
|
SEZ |
323 |
2 Chambers |
00938 |
8, 12 |
2005 |
Taiwan |
|
SEZ |
DV34 |
4 Chambers |
875 |
8, 12 |
Austria |
|
|
SEZ |
DV34 |
4 Chambers |
1225 |
8, 12 |
2007 |
Austria |
|
SEZ |
DV34 |
4 Chambers |
1242 |
8, 12 |
2007 |
Austria |
|
SEZ |
ES34 |
4 Chambers |
1125 |
8, 12 |
2008 |
Austria |
|
SEZ |
ES34 |
4 Chambers |
1160 |
8, 12 |
2008 |
Korea |
|
TEL |
Expedius + |
W083557 |
12 |
2007 |
Taiwan |
|
|
TEL |
Expedius + |
W072491 |
12 |
2007 |
Taiwan |
|
|
ASM |
A412 |
Dual ATM Oxide (Dry Oxide) |
30360 |
12 |
2007 |
Taiwan |
|
ASM |
A412 |
Dual Reactor Poly |
30412 |
12 |
2004 |
Taiwan |
|
ASM |
A412 |
Dual Reactor Poly |
30350 |
12 |
Taiwan |
|
|
ASM |
A412 |
Nitride Dual Reactor |
30127 |
12 |
Taiwan |
|
|
ASM |
A412 |
Vertical LPCVD Furnace (Poly) |
30294 |
12 |
Taiwan |
|
|
ASM |
A412 |
Vertical LPCVD Furnace (Poly) |
30312 |
12 |
Taiwan |
|
|
ASM |
A412 |
Vertical LPCVD Furnace (Poly) |
30265 |
12 |
Taiwan |
|
|
ASM |
A412 |
Vertical LPCVD Furnace (Poly) |
30297 |
12 |
Taiwan |
|
|
ASM |
A412 |
Vertical LPCVD Furnace (Poly) |
30295 |
12 |
2006 |
Taiwan |
|
ASM |
A412 |
Vertical LPCVD Furnace (Poly) |
30271 |
12 |
2006 |
Taiwan |
|
ASM |
A412 |
Vertical LPCVD Furnace (Poly) |
30298 |
12 |
2006 |
Taiwan |
|
ASM |
A412 |
Veritcal LPCVD Furnace (NITR) |
30270/10 |
12 |
2006 |
Taiwan |
|
ASM |
Eagle-12 Rapidfire |
PECVD (Chemical Vapor Deposition) |
1289 |
12 |
Taiwan |
|
|
ASM |
A400 |
Nitride, x01 Reactor |
2E0127/10 |
8 |
Dresden |
|
|
Suss Microtec |
Falcon |
Coat / Develop |
AK243267 |
4, 5, 6, 8 |
2002 |
Austria |
|
Suss Microtec |
ACS200/Falcon |
3x Coater |
AK20032 |
4, 5, 6, 8 |
2000 |
Austria |
|
Suss Microtec |
ACS200/Falcon |
4x Developer |
AK20033 |
4, 5, 6, 8 |
2000 |
Austria |
|
Suss Microtec |
ACS300 |
4x Developer |
256426 |
8, 12 |
2008 |
Austria |
|
Suss Microtec |
Gamma |
300084 |
2010 |
Singapore |
||
|
Suss Microtec |
Gamma |
255653 |
2010 |
Singapore |
||
|
Suss Microtec |
Gamma 80 |
Coater-CSM |
AK-40126 |
Taiwan |
||
|
Suss Microtec |
Gamma 80 |
Coater-CSM |
Taiwan |
|||
|
Semitool |
Raider |
ECD 310 |
T239383 |
12 |
2009 |
Philippines |
|
Semitool |
Raider |
ECD210 |
T239451 |
6 |
2010 |
Philippines |
|
Semitool |
Raider Mini Quatro |
T239257 |
Philippines |
|||
|
Semitool |
STORM |
300 |
T239537 |
12 |
2010 |
Philippines |
|
Semitool |
STORM 3 |
H174554 |
6 |
Philippines |
||
|
Semitool |
STORM 3 |
H92738 |
4 |
Philippines |
||
|
Semitool |
SST 201 (Cintillio) |
1 Chamber |
102893 |
8 |
2011 |
China |
|
Semitool |
SST 742 |
Wet |
F59353 |
6 |
China |
|
|
Semitool |
SST 742 |
Wet |
F106911 |
8 |
Japan |
|
|
Semitool |
SSTC421280M |
Spray solvent tool (Phototresist) |
F110681 |
8 |
Dresden |
|
|
DNS |
SU-3100 |
4 Chambers |
530L001006A |
12 |
2008 |
Japan |
|
DNS |
FC-3100 |
630600108A |
12 |
Korea |
||
|
DNS |
FC821L-L22, WCSS30 |
630200023A |
8 |
Dresden |
||
|
DNS |
WS-620 C |
Wafercleaner Card; 3 Baths |
58520-1074 |
6 |
Dresden |
|
|
DNS |
FS-820 L |
Wafercleaner, 3 Baths |
58630-0184 |
6 |
Dresden |
|
|
DNS |
FS-820 L |
Wafercleaner, 3 Baths |
58630-0185 |
6 |
Dresden |
|
|
Hitachi |
S-8840 |
CD-SEM |
USA |
|||
|
Hitachi |
S9220 |
CD-SEM |
9744-06 |
8 |
Singapore |
|
|
Hitachi |
S-9260A |
CD-SEM |
1140-05 |
8 |
2011 |
Dresden |
|
Hitachi |
S-9260A |
CD-SEM |
1126-02 |
8 |
2003 |
Singapore |
|
Hitachi |
S-9260A |
CD-SEM |
1130-02 |
8 |
Singapore |
|
|
Hitachi |
S-9360 |
CD-SEM |
0106-04 |
8, 12 |
2012 |
Singapore |
|
Hitachi |
S-9380II |
CD-SEM |
8, 12 |
2009 |
Singapore |
|
|
Hitachi |
S-3400N |
SEM |
340760-02 |
2007 |
Singapore |
|
|
Hitachi |
S-4500 |
SEM |
7910-5 |
1993 |
Singapore |
|
|
Hitachi |
S-4800 |
SEM with EDX |
9140-05 |
2007 |
Singapore |
|
|
Hitachi |
S-5000 |
SEM |
914-03 |
1995 |
Singapore |
|
|
Hitachi |
S-5000H |
SEM |
6936-02 |
1998 |
Singapore |
|
|
Hitachi |
S-7840 |
CD-SEM |
0008-02 |
8 |
2001 |
Dresden |
|
FEI |
Helios 400 |
Dual Beam |
D5031 |
Singapore |
||
|
AMAT |
Semivision CX200 |
- |
W-853 |
Singapore |
||
|
Ultrafab |
WetBench QD72 |
2 tank Wet Bench |
15135-06 |
6 |
1995 |
Dresden |
|
TEGAL |
Tegal 901 (Poly) |
Etch |
10764 |
6 |
Dresden |
|
|
Comet |
(7) R20 Transfer Station |
6, 8 |
Dresden |
|||
|
Comet |
Comet 2 Station wafer Transfer System |
10AA0602 |
Dresden |
|||
|
Philips |
XRF 2800 |
943002800001 |
8 |
2000 |
Dresden |
|
|
Prometrix |
FT750-01 |
9209 |
Dresden |
|||
|
RECIF |
ANF8 |
Notch Aligner |
8 |
Dresden |
||
|
RECIF |
BPP200A01 |
Transfer Station |
Dresden |
|||
|
TEL |
Ofen Tel Minibatch |
Formula Nitride |
P00000315001 |
12 |
2004 |
Dresden |
|
TEL |
Ofen Tel Minibatch |
Formula Oxide |
P00000315002 |
12 |
2004 |
Dresden |
|
TEL |
UW200Z |
Batch Wafer Processing |
R031085 |
8 |
2003 |
USA |
|
Applied Materials (AMAT) |
eMax CT plus |
eMax CT+ Dielectric etch chamber |
25596-07 |
12 |
2007 |
Austria |
|
Applied Materials (AMAT) |
eMax CT plus |
eMax CT+ Dielectric etch chamber |
30999-13 |
12 |
2007 |
Austria |
|
Applied Materials (AMAT) |
eMax CT |
eMax CT Dielectric etch chamber |
04403-10 |
12 |
2003 |
Austria |
|
Applied Materials (AMAT) |
Axiom HT plus |
Axiom HT+ strip chamber |
08595-16 |
12 |
2007 |
Austria |
|
Applied Materials (AMAT) |
Enabler |
Enabler Dielectric etch chamber |
11596-11 |
12 |
2007 |
Austria |
|
Applied Materials (AMAT) |
Enabler |
Enabler Dielectric etch chamber |
29196-08 |
12 |
2007 |
Austria |
|
Leica |
Microskope |
166495 |
8 |
1995 |
Austria |
|
|
Leica |
Microscope INS 10 |
Microscope |
80135 |
6 |
1999 |
Dresden |
|
Laserjet |
LDS200A |
LDS3 |
0047 |
6 |
2006 |
Austria |
|
Laserjet LDS 200A |
LDS200A |
LDS1 |
0029 |
6 |
2006 |
Austria |
|
Matech |
WaveEtch 456-G2 |
G2/2-1107A |
6, 8 |
2007/11 |
Austria |
|
|
IPEC/Westech |
Avanti 472 |
Wafer Polisher |
472-261 |
6 |
Dresden |
|
|
TePLA |
300 AL PC |
Plasma/Etch |
1414 |
6 |
2000 |
Dresden |
|
TePLA |
300 AL PC |
Plasma/Etch |
1390 |
6 |
2000 |
Dresden |
|
TePLA |
300 AL PC |
Plasma/Etch |
1402 |
6 |
2000 |
Dresden |
|
TePLA |
300 AL PC |
Plasma/Etch |
1394 |
6 |
2000 |
Dresden |
|
Linn High Therm |
KH-64-S |
Coating oven |
FX039092 |
2009 |
Dresden |
|
|
Rigaku Europa GmbH |
XRF 3630 |
Wafer Analyzer |
RR42036 |
8 |
1995 |
Austria |
|
Veeco |
Dektek 8 |
Metrology |
23089 |
Dresden |
||
|
Watkins Johnson |
WJ-999/TEOS-3.6 |
5670 |
6,8 |
Dresden |
||
|
Watkins Johnson |
WJ-999/TEOS-3.6 |
5685 |
6,8 |
Dresden |
||
|
Brand |
Model |
Description |
Serial Number |
Wafersize |
Year of Manufacture |
Location |
