NS has produced both small batch typeAs research and large batch type as Production. Ion Milling System is optimal etching technology for Magnetic materials, Gold, Platinum and Alloyed metals. It is very easy to do milling of many kinds of materials. Main application *Thin film Magnetic Head *Spintronics *MR Sencer *MEMS *RF Devices *Optical Component *Super Conductivity
Ion Milling System
Ion Beam Milling System
10IBE (10cm Ion Source)
Ion Beam Miling for Research System Small foot print
8cm or 10cm Kaufman Type Ion Source
Substrate size: 4inch Dia. X 1sheet
Single Stage and Direct cooling Stage
20IBE-C (20cm Ion Source)
Ion Beam Milling System for production
20cm Kaufman type Ion Source
Substrate size:
3inch Dia. X 8sheets
4inch Dia. X 6sheets
6inch Dia. X 4sheets
Planetary Stage
Excellent uniformity by planetary movement
20IBE-J (20cm Ion Source)
Large Ion Beam Milling System
20cm Kaufman Type Ion Source
Substrate size:
4inch Dia X 12sheets
5inch Dia X 10sheets
6 inch Dia X 8sheets
Planetary Stage
Excellent uniformity by planetary movement
