Feature of Products
Applicable to variety industries from semiconductor, solar cells and etc
Small to large volume production
Variety types of films like SiO2, BPSG, BSG, PSG, AlOx
Heavy metal contamination free by using silicon carbide trays
Deposite films at wide range of temperature from 200°C to 500°C
Semiconductor Production System
A200V
Single Wafer APCVD
AMAX800V
Continuous High Throughput APCVD for 8 inch wafers
AMAX1200
Continuous APCVD for 12 inch wafers
A6300S
Continuous High Throughput APCVD for 6 inch or below
Customized APCVD
D501
Batch Type APCVD
Solar Cell Production System
AMAX1000S
Solar Cell Production Continuous High Volume APCVD for 125mm x 125mm cell or 156mm x 156mm cell
Atmospheric Pressure Low Temperature SiH4-O3 CVD System
In-line APCVD for rigid/flexible electronics such as FPD.
