Products＆Technology
Fabrication and Sales of all kinds of high-precision processed products made of High-purity quart and crystal silicon are Techno Quartz's core business.
To take full advantage of technologies and experiences ever achieved in the semiconductor field ,where high product quality is always expected, Techno Quartz fabricates and supplies our quality products to our valued customers all over the world.
Case example of Quartz glass fabrication
Processed quartz products:
Mainly used for semiconductor manufacturing process or for laboratory glassware.
Quartz Ring
Furnace Tube
Reactor
Quartz cell for Spectral photometer application
Processed quartz products with advanced technologies
Quartz Plate with Encapsulation of Non-Quartz Material
(Diffusion bonding products)
Inner Tube
(Ceramics thermal spray coat on inside wall)
Case example of crystal silicon fabrication
These are processed crystal silicon products used for semiconductor/FPD manufacturing process.
Larger silicon parts are made of polycrystalline silicon materials.
Silicon shower plate
Large plate (800 x 800mm)
Other technologies and Services
Micro-fabrication technology
Ultra-precision machining enables processing of smaller diameter holes and 3D fine channels. Techno Quartz is able to make various fabrication proposals according to ideas.
Sample introduction
chip with 4 channels
Micro-mixer with channels
Patterning process with wet etching
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Application
Micro-chip/Micro-reactor/Micro-mixer
With our own bonding technology, Techno Quartz proposes to fabricate micro-chip of high pressure capacity.
Patent:
Patent# 4729763: Etching method for quartz substrate
Patent# 4841063: Micro-channel structure and its fabrication method
Cleaning service
Applicable SEM processes
CVD
Spattering
Ion Milling
Dry etching
Epitaxial
※Please feel free to contact us for the other processes
Materials
Ceramics, Silicon, Metals(SUS, Al, Hastelloy),
Coated products(Alumite, et al)
Case example of cleaning
Although it depends on types of film, deposits are capable of removal from deposited surface of ceramics and metal parts.
Cleaning methodology applied to do much less damage to base materials keeps the surface condition as it originally was
Quartz surface treatment with plasma-resistance
CVD Yttria is a transparent protection film which features excellent plasma-resistance property.
CVD Yttria is an adhesive, scrupulous type of film, so is very effective as a protection film applied to window products, used in plasma-treated process using CI and F gases.
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Fluorocarbon resin coating
Techno Quartz is capable of coating quartz substrate with high-purity PFA, which provides excellent performance in heat resistance, chemical resistance, and abrasion resistance
Product features
Contained particles, and reduced contamination
Excellence in chemical resistance, heat resistance,
and abrasion resistance
High adhesion
Reproducing coating layers
Case example of PFA coating:
PFA coated on quartz substrate
Cutting-edge technology of part tracing technology
Graphic character codes such as QR codes or barcodes, through which Handy Terminal or barcode reader recognizes part# and serial# and so on, are laser-engraved in the quartz body. They help to improve the accuracy of traceability controls and work efficiency.
According to applications, Techno Quartz is capable of laser-marking 1D/2D code, location alignment mark, or identification label into the quartz body.
Planar quartz substrate
Quartz tube substrate and cylindrical quartz substrate
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Patent:
Patent# 6412156: Product embedded with tracing information
Self-supported film with a porous structure
Manufacturing method of self-supported film in which porous coat gets detached from a substrate undamaged enables fabrication of porous structure made of ceramics and metals with high melting points to cost less.
This feature is effective in larger surface areas, heat insulation, and lightweight where porous characteristics are taken advantage of.
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Patent:
Patent# 5849083: Manufacturing method of porous structure and self-supported film
Analysis and evaluation
Techno Quartz provides a variety of analyses and evaluations to raw materials and processed products for our own quality controls and evaluations of sampling products.
SEM-EDX
Processed surface
(Observed with SEM at 2000 magnifications)
Geometry estimations of micro-fabricated products
(Observed with laser microscope)
Thermal characterization
(Heat viscosity property test)
Mechanical Characterization
(Bending strength test)
Optical Characterization
(Spectrometry)
Numerical simulation
(Architectural analysis)
Head
Raw materials
Quality quartz glasses, which Techno Quartz processes into a variety of components, feature
good heat resistance, high purity, and transparency.
Quartz Glass material
Quartz glass ingot
(weight: approx.3 tons)
Quartz glass is classified into 2 different types:
One is fused quartz fabricated by melting natural quartz crystal powders and the other is synthetic quartz, which is fabricated by chemically synthesizing silicon tetrachloride.
Other than SiO2 as principal component, there exists a fairly modest amount of hydrogen and chlorine (at most 0.1%) to form Si-OH group and Si-Cl group inside quartz. However, metal impurities are very little with some containing at most 10ppm and others containing less than 10ppb of metal impurities.
As seen above, quartz glass features many such properties as heat resistance, light transmission, electrical insulation, and chemical stability besides its high purity.
Standard physical property of fused quartz glass
CHARACTERISTIC STANDARD VALUE
Specific gravity 2.2×103kg/m3
Hardness 5.5-6.5(Mohs） 570KHN100
Tensile strength 4.8×107Pa（N/m2）（7000psi)
Compressive strength 1.1×109Pa以上（160,000psi)
Volume elasticity 3.7×1010Pa（5.3×106psi)
Rigidity modulus 3.1×1010Pa(4.5×106psi)
Young's modulus 7.2×1010Pa（10.5×106psi)
Poisson ratio 0.17
Coefficient of thermal expansion (20-320 degree-c) 5.5×10-7cm/cm・℃
Heat conductivity 1.4W/m・℃
CHARACTERISTIC STANDARD VALUE
Specific heat 670J/kg・℃
Softening point
1683℃
Slow cooling point 1215℃
Strain point
1120℃
Specific resistance
(350 degree-c) 7×107Ω・cm
Refracture index 1.4585
Astringency 67.56
Sonic velocity
(Transverse wave) 3.75×103m/s
Sonic velocity
(Longitudinal wave) 5.90×103cm/s
Sound-wave damping ratio 11dB/m MHz or less
Crystal silicon material
Large crystal silicon（Square 800mm）
Silicon is the second most common element to oxygen on the earth.
Silica stone, combined with oxygen to be a chief component of dirt and sand in nature, is something familiar to us.
Crystal Silicon , purified by reducing, distilling, and then refining silica stone, is one of the vital semiconductor raw materials in fabrication of silicon substrate from which IC chips origin
Techno Quartz fabricates and supplies a variety of highly pure Crystal Silicon products for Semiconductor Manufacturing equipment.
