Air Gas Electronic Materials Enterprise Co., Ltd (AGEM) is a manufacturer. Our head office is located in Taiwan. With over 20 years of experience in the supply of industrial, ultra high purity pure gases, speciality gases, high purity materials, gas and chemical delivery systems and engineering requirements including design and consultancy to the semiconductor, solar, LED, DRAM, TFT-LCD, oil and gas, R & D, institutions and all types of industries.
AGEM can provide you with the necessary materials to launch your products to the cutting edge of the industry. Our products (BCL3, N2O, C2F6, C4F8, C4F6, CHF3, SiH4, SF6, CF4, Neon, GeH4 and etc.) satisfy the electronics industry’s exacting standards for safety, quality, control, reliability and performance, and we offer a value-add portfolio of ultra-high-purity process gases, precursors and sputtering targets to meet your needs. And with state-of-the-art facilities in China mainland, Taiwan, India, UK and UAE we have the means to maintain a reliable product supply for our customers across the Globe.
Electronic gases are used for micro electric manufacturing or for semiconductor processing applications like thin film deposition- including physical vapor deposition and chemical vapor deposition, etching, packaging, RTP, or soldering. Electronic gases can either be pure gases or gas mixtures. Oxygen is used for the oxidation of silicon, one of the most critical processes in all of semiconductor manufacturing. Argon is used to provide an inert environment for sputter deposition of metals (where even nitrogen is too reactive and leads to the formation of metal nitrides).
Acetylene
Ammonia
Argon
Arsine
Boron trichloride
Boron trifluoride
Carbon dioxide
Chlorine
Chloropentafluoroethane
Deuterium
Diborane
Dichlorosilane
1,2-Dichlorotetrafluoro ethane
Difluoromethane
Fluorine
Fluoromethane
Helium
Hexafluoroethane
Hydrogen
Hydrogen bromide
Hydrogen chloride
Hydrogen fluoride
Hydrogen iodide
Hydrogen sulfide
Krypton
Methyl chloride
Neon
Nitric oxide
Nitrogen
Nitrogen trifluoride
Nitrous oxide
Octafluoropropane
Oxygen
Phosphine
Silane
Silicon tetrachloride
Silicon tetrafluoride
Sulfur hexafluoride
Tetrafluoromethane
Trichlorosilane
Trifluoromethane
Xenon
SOLAR
For many, natural gas is seen as a cleaner alternative to other types of fossil fuels, and the United States has been at the forefront of adopting natural gas for its energy production. Electricity created by utility-scale solar power plants grew over 100%.
Ammonia (NH3)
Dichlorosilane (SiH2Cl2)
Disilane (Si2H6)
Hexachlorodisilane (Si,Ci)
Monomethylsilane (MMS)
Nitric oxide (NO)
Nitrous oxide (N2O)
Oxygen (O2)
Silane (SiH4)
Trichlorosilane (SiHCl3)
Trimethylsilane (3MS)
Tungsten hexafluoride (WF6)
Boron trichloride (BCl3)
Carbon dioxide (CO2)
Hydrogen sulphide (H2S)
Nitrogen (N2)
Argon (Ar)
Carbon monoxide (CO)
Chlorine (Cl2)
Chlorine trifluoride (ClF3)
Difluoromethane - Halocarbon 32 (CH2F2)
Fluorine (F2)
Fluorine Nitrogen mixture (20% F2/N2 mixture)
Hexafluoro-1, 3-butadiene - Halocarbon 2316 (C4F6)
Hexafluoroethane - Halocarbon 116 (C2F6)
Hydrogen bromide (HBr)
Hydrogen chloride (HCl)
Hydrogen fluoride (aHF)
Methyl fluoride - Fluoromethane - Halocarbon 41 (CH3F)
Nitrogen trifluoride (NF3)
Octofluorocyclobutane - Halocarbon 318 (C4F8)
Helium (He)
Hydrogen (H2)
Octofluorocyclopentene - Halocarbon 1418 (C5F8)
Octofluoropropane - Halocarbon 218 (C3F8)
Silicon tetrafluoride (SiF4)
Sulphur hexafluoride (SF6)
Tetrafluoromethane - Halocarbon 14 (CF4)
Trifluoromethane - Halocarbon 23 (CHF3)
Xenon difluoride (XeF2)
Arsine (AsH3)
Boron-11 trifluoride (11BF3)
Diborane (B2H6)
Diborane (11B2H6)
Diborane (B2H6)
Diborane (11B2H6)
Germane (GeH4)
Phosphine (PH3)
Trimethyl-Boron (TMB)
