FOUP and Cassette Cleaning Systems

Semiconductor Equipment Solutions. Wet Bench Process Equipment, Single Wafer Wet Process Equipment, FOUP cleaner

Semiconductor: FOUP Cleaner, POD Cleaner, Wet Station, Chemical Delivery Supply System, Metal Lift Off, Cassette & Magazine Cleaner. Display: OLED Mask Cleaner, Glass Cleaner, Etcher & Stripper, Auto Macro Inspection, Stream-Jet Printing, Lamination M/C,

Wet Station, Ultrasonic Cleaner, Tube Cleaner and Parts Cleaner for semiconductor and FPD production parts cleaning equipment. Chemical Supply System

CMP (Chemical Mechanical Polishing), Wet Cleaning Systems. Display Equipment: Wet Station, APP (Atmospheric Pressure Plasma Cleaner), CO₂Cleaner, Coater & Track System. CMP Slurry and nano dispersion solution

Central Chemical Supply System / Wet System / Inkjet Printing System for semiconductor and display

Wafer Transfer Robots, FOUP Handling Robot, Reticle / Mask Handling Robot, Load Port / Loader, Aligners, EFEM (Equipment Front End Module)

Silicon Test Wafer, Dummy/Mechanical Wafer, Silicon Spacer wafer, Epitaxial wafer, photomask,

Wafer box, wafer carrier, wafer cassette, wafer carrier handle, RSP (reticle SMIF pod), RSP opener, mask case, chip tray, fluoro valves, cleanroom supplies, wafer and cassette cleaning systems

Clean room air purification, high-precision control of temperature and humidity and the reduction of fluctuations in the magnetic field. Cleaning and drying technologies for the cleaning of wafers, quartz tubes, and tools.

Cleaning systems and chemicals, contamination control for semiconductor, optics, photonics HDD assembly.

Manufacturing environment, process and material monitoring in the semiconductor and display industries.

Semi-automatic and automatic systems for wet-processing, for the supply and disposal of chemicals, and laboratory equipment.

Dicing tapes, wafer mounters, die ejector, pick and place system, die matrix expander, die bonders, FOUP and cassette cleaners

FOUP and cassette cleaning systems manufacturer. Ionizers, ESD removal bar, ultrasonic wafer and substrate cleaner, wafer and reticle cleaning systems,