Semi-Conductor Equipment
Wet Station
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Auto Wet Station
It etches and cleans any stacked membranes on the board of Silicon or Sapphire Wafer.
Wafer Application : 5”, 6”, 8” and 12” Silicon Wafer
Loading Method : Auto ~ Manual
Processing Method : Cassetteless or Cassette Type
Bath : Teflon & Quartz etc
Chemical : ACID, Organic, Alkali
Controller : PLC & Touch Based Control
Remark : Heating Unit / Chemical Circulation & Filtering / DIW Non-Ohmmeter / G.U.I & Host On-Line is performable.
Tube Cleaner
Parts Cleaner
Spin Dryer
PLP Cleaner
Plating System
Display Equipment
CG
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COVER GLASS CLEANER [Dry Process Type]
It cleans the remaining dust after removing film / before POL attachment & lamination process.
Cell Application : 4”~7” Cover Glass
Loading Method : Cassette or Tray (Manual Loading is OK)
Processing Method : Clean Wiper Cleaning Type
Chemical : Ethanol
Host On-Line : CIM-PC
Safety Certificate : CE Certificate
Option Item : Vision Align, MCR Reading, USC Unit
