Thin Film Deposition Equipment

Semiconductor Equipment Solutions. Wet Bench Process Equipment, Single Wafer Wet Process Equipment, FOUP cleaner

Water quality analysis instrument, electroplating processing equipment: rectifiers, pumps, heaters, and plasma cleaners

Plasma Technology, Electromagnetic Shield Technology, Gas Purification Technology, Automation System Technology, Precise Alignment Technology in Vacuum

Technologies for ALD, CVD, ETCHER, and CLEANING semiconductor equipment using Helicon plasma.

Wet Station, Ultrasonic Cleaner, Tube Cleaner and Parts Cleaner for semiconductor and FPD production parts cleaning equipment. Chemical Supply System

CMP (Chemical Mechanical Polishing), Wet Cleaning Systems. Display Equipment: Wet Station, APP (Atmospheric Pressure Plasma Cleaner), CO₂Cleaner, Coater & Track System. CMP Slurry and nano dispersion solution

Thermal LPCVD, Plasma Treatment System, Thermal ALD System, Dry Cleaning System

OLED Sputter Production

EVAPORATION SOURCE (Point Source, Linear Source) and VACUUM SYSTEM (OLED System, Sputtering System)

Sputtering System, OLED System, Solar Module System, AMHS, AS/RS, 3D Printer, Converting Machine

Manufacture Furnaces. Refurbishment and relocation of diffusion furnaces and RTP equipment. Spare parts

LPE is currently offering two families of reactors with medium frequency heating: the first family consists of Barrel reactors including the PE 2061 S Batch reactor; the second family includes the PE 3061 reactor with automatic wafer loading.

OLED Display Manufacturing Equipment, Thin-Film Photovoltaic Cell Manufacturing Equipment, Vacuum Process Equipment

We design and manufacture advanced thin film deposition systems for Molecular Beam Epitaxy (MBE), UHV Magnetron Sputtering and Pulsed Laser Deposition.

Vacuum plasma equipment, Physical and thermal equipment,

Vacuum coating equipment and process technologies

PECVD, PVD and ALD thin film deposition equipment

Equipment for wet surface treatment (Capacity: 100L or below), testing and analyzing equipment for wet surface treatment, surface treatment related products (equipment, materials and chemicals).

Monocrystalline growing furnaces for SiC, InP, GaP, GaAs, CDZ, InSb. Furnace for poly- GaAs, CdTe. Diffusion furnaces. Vacuum Equipment. Wet Process Equipment.

Ultrasonic coating systems for applying precise, thin film coatings to protect, strengthen or smooth surfaces on parts and components for the microelectronics/electronics, alternative energy.