Thin film deposition in ultra high vacuum (UHV) environment is our business. We design and manufacture advanced thin film deposition systems for Molecular Beam Epitaxy (MBE), UHV Magnetron Sputtering and Pulsed Laser Deposition. Since the company was founded in 1989, DCA has installed more than 200 UHV systems around the world.
Weare a Finnish company located in Turku, in the southwest corner of Finland. We offer our customers high quality Finnish design and workmanship. A large part of our business has always been building complex, custom design deposition systems. We utilize our custom design background in the manufacturing of our standard systems. Our design flexibility is valued by our customers. Many of our standard systems have started as a solution to a customer’s particular deposition process.
DCAis the world leader in oxide MBE. We have systematically developed our oxide technology, oxygen resistant substrate heating and oxygen resistant sources since 1993. Therefore many leading laboratories have chosen DCA oxide technology. Our compound semiconductor MBE systems are in use around the world, both in R&D and in epiwafer production. DCA is continuously developing new sources and other MBE components for advanced compound semiconductor epitaxy.
Ourstandard system range extends from small R&D systems with 10 mm x 10 mm sample size to multi-wafer 4 x 4″ and 200 mm MBE and sputtering systems. DCA was the first to introduce a true UHV cluster tool with a UHV robot for automatic wafer handling.
OUR PRODUCTS
R&D MBE Systems
Custom MBE Systems
Production MBE Systems
MBE Components
UHV Sputtering
Substrate Transfer Systems
AllAll/Custom MBE Systems/MBE Components/Production MBE Systems/R&D MBE Systems/Substrate Transfer Systems/UHV Sputtering
APEX-3i
UHV Sputter Magnetron
Dual Chamber P600 Cluster Tool at EPFL
Custom M800 MBE System at Southampton University
Cluster tool for CIGS development
Phosphorus Cracker
Antimony Cracker
Dual filament cell
Cold lip cell
Low temperature cell
Titanium cell
High temperature cell
Retractable Effusion Cell
Arsenic Valved Cracker
P600 3 x 2" MBE
P1000 4 x 4" MBE
S800 200 mm MBE
R450 MBE
P600 MBE System
M600 MBE System
Linear Transfer System
Radial Transfer Chamber
Automated Cluster Tool
Mini MBE
M800 MBE
UHV PLD (Laser MBE)
S450
L400
L4 Sputtering System
