Epitaxial Equipment

EVAPORATION SOURCE (Point Source, Linear Source) and VACUUM SYSTEM (OLED System, Sputtering System)

LPE is currently offering two families of reactors with medium frequency heating: the first family consists of Barrel reactors including the PE 2061 S Batch reactor; the second family includes the PE 3061 reactor with automatic wafer loading.

We design and manufacture advanced thin film deposition systems for Molecular Beam Epitaxy (MBE), UHV Magnetron Sputtering and Pulsed Laser Deposition.

Vacuum plasma equipment, Physical and thermal equipment,

EB Mask Writer, Mask Inspection System, Epitaxial Reactors

Multi-wafer Epitaxy reactor development. Custom Tailored Equipment Solutions and Design Services

PVD, CVD and MVD capital equipment, providing advanced wafer processing technologies and solutions for the semiconductor and microelectronics industry. End-market applications MEMS, advanced packaging, LED, high speed RF device IC’s and power semicon.

Semiconductor and LCD equipment manufacturers in the field of CVD (LPCVD, PECVD, MOCVD), ALD Etcher

PECVD, LPCVD and dry cleaning equipment for semiconductor. Deep UV LED Epitaxial growth equipment.

Epitaxy tool to meet todays demanding production requirements. Spare parts.

MBE (Molecular Beam Epitaxy) systems and components. Sources for thin film deposition. UHV deposition and annealing systems.

MOCVD Solutions and Services for R&D and Production

MBE (Molecular Beam Epitaxy) systems and components

Chemical vapor deposition systems, gas & liquid delivery cabinets, gas panels, and related gas abatement systems.

Thin film process equipment that enables high-tech electronic device production and development all over the world