Lithography

Photomask production for silicon wafer fabrication process. An alliance between Dai Nippon Printing Co., Ltd. and STMicroelectronics NV

Silanes for Chemical Vapor Deposition (CVD) and Spin-On Dielectrics (SOD), Silanes for Photolithography, Silica for Chemical-Mechanical Polishing (CMP), Hyperpure Hydrogen Chloride for Etching

Sapphire substrate (PSS) special photoresist, lift-off photoresist, flexible photoresist, nano-imprint photoresist, SU-8 thick photoresist and other high-end photoresists and ancillaries for LED, LCD, IC, MEMS, packaging.

Wafer and Substrate Mounters (Manual and Semi-automatic), Table-top UV Irradiators, Expanders, CO2 Bubblers, Transformers and other process automation equipment

Semiconductor equipment and mobile phone manufacturing automation systems, robots for factory automation, equipment

High Purity Etching Gas, High Purity CVD, Photosensitive Materials, Resins Photo/Thermal Initiators

Materials for semiconductor manufacturing process: polymer (Resin), photoresist (PAG), and additives, and materials such as Resin for SOC, Resin for BARC, and Acid Generators. Coating materials

Blankmasks for Semiconductors, Blankmasks for Display Panels

Semiconductor products: photoresists (PR), bottom anti-reflective coatings (BARC), spin-on-carbon (SOC), CMP slurries, wet chemicals, colored resist, organic insulating layer materials.

Nanoimprint lithography (NIL) tools, resists, masks, and processes for a variety of NIL including thermal and photo-curable NIL, as well as direct imprinting of materials.

Silicon Test Wafer, Dummy/Mechanical Wafer, Silicon Spacer wafer, Epitaxial wafer, photomask,

PHOTOMASK HANDLING, WAFER CARRIERS, FLUID MANAGEMENT, PRECISION PARTS

150mm SMIF Pods, 200mm SMIF Pods, 300mm FOUP, 300mm FOSB, reticule SMIF Pods, Pod Opener, Pod N2 charger, etc

Wafer box, wafer carrier, wafer cassette, wafer carrier handle, RSP (reticle SMIF pod), RSP opener, mask case, chip tray, fluoro valves, cleanroom supplies, wafer and cassette cleaning systems

Test Reticles, Software, Position Calibration Wafers, Quantitative Phase Microscopy Target, Grating-Based Products.

Photomask production for silicon wafer fabrication process

Maskless photo lithography equipment, Laser de-bonding equipment, inspection and sorting equipment

Solar cell materials, Photoresists, CMP Slurry, Developers

Semiconductor Materials: Laser Release Layer, Photosensitive Dielectric/Passivation, Protection Layer, Chemicals for Wet Clean, Chemicals for Nanolithography, Flexible OLED/EPD Material, MicroLED Materials, Binder for Si Based Anode, LCD Materials

Photoresist, Alignment Film, Wet Process Chemicals, HIPS Film for Tray, Carrier tape.