Nanonex Corp

Nanonex Nanoimprintor Family

Nanonex utilizes patented Air Cushion PressTM to ensure maximum nanoimprint unformity. The unique Smart Sample Holder design allows the handling of samples of different sizes and irregular shapes. The full-wafer imprinting scheme enables a high processing throughput.

NX-B100/200
NX-B100/200, Full-Wafer Thermal Nanomprintor

    Full-wafer nanoimprinting tool
    All forms of nanoimprint: photo-curable, thermoplastic & embossing
    Patented Air Cushion PressTM (ACP) for ultimate nanoimprint uniformity
    High throughput due to full-wafer imprinting and minimized thermal mass
    Smart Sample Holder for handling different sizes and irregular shapes
    Applications in opto, displays, biotechnologies, data storage, materials, ..., etcÂ
NX-1000
NX-1000, Full-Wafer Thermal Nanomprintor

    Full-wafer nanoimprinting tool for thermoplastic and thermal curable resists
    Patented Air Cushion PressTM (ACP) for ultimate nanoimprint uniformity
    High throughput due to full-wafer imprinting and minimized thermal mass
    Smart Sample Holder for handling different sizes and irregular shapes
    Applications in opto, displays, biotechnologies, data storage, materials, ..., etcÂ
NX-2000
NX-2000, Full-Wafer Universal Imprintor

    Full-wafer (up to 12") nanoimprinting tool
    Patented Air Cushion PressTM (ACP) for ultimate nanoimprint uniformity
    All forms of nanoimprint: photo-curable, thermoplastic & embossing
    High throughput due to full-wafer impriting: sub-60 sec/wafer
    Optional alignment upgrade available
    Smart Sample Holder for handling different sizes and irregular shapes
    Applications in opto, displays, biotechnologies, data storage, materials, ..., etcÂ
NX-2500
NX-2500, Full-Wafer Imprintor with Alignment

    Full-wafer (up to 8") nanoimprinting tool
    Patented Air Cushion PressTM (ACP) for ultimate nanoimprint uniformity
    Sub-micron overlay alignment accuracy
    User friendly alignment scheme
    Smart Sample Holder for handling different sizes and irregular shapes
    Applications in opto, displays, biotechnologies, data storage, materials, ..., etcÂ
NX-2600
NX-2600/2600BA, Full-Wafer Imprintor with Alignment and Photolithography

    Full-wafer (up to 8") nanoimprinting tool
    All forms of nanoimprint and high resolution photolithography
    Patented Air Cushion PressTM (ACP) for ultimate nanoimprint uniformity
    Sub-micron overlay alignment accuracy and optical backside alignment (NX-2600BA)
    User friendly alignment scheme
    Smart Sample Holder for handling different sizes and irregular shapes
    Applications in opto, displays, biotechnologies, data storage, materials, ..., etc
NX-3000
NX-3000, Step-and-Repeat Nanoimprintor With Alignment

    Step-and-repeat nanoimprinting tool
    Sub-micron alignment accuracy
    Enhanced Air Cushion Press (EACP) ensuring uniformity over entire substrate
    Photo-curable NIL, upgradable to thermal curable
    Integrated resist-drop dispensing system
    Sub-70 sec per imprint field
    Up to 8" SEMI standard wafers
    Applications in semiconductors, micro-wave, opto, displays, bio, data storage, materials,..., etc.
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Lumina-200
Lumina-200, Stand-Alone High Resolution Photolithography/Aligner

    High Resolution Photolithography
    High Precision Alignment Stages
    State-of-the-Art Alignment Optics
    Precise Gap Control
    User Friendly PC Control
    Small Footprint
    Cost Effective Design
    Backside Alignment Available as Option

Nanonex Material Family

Nanonex offers a variety of nanoimprint materials, including resists tailored
for thermoplastic, photo-curable and thermal curable NIL, surface treatment
agents for various purposes, and mold materials. Customized materials
are also available.

    NXR-1000 Series, Thermoplastic and Thermal Curable Resists
    Sub-10 nm resolution and wafer-scale uniformity
    Ultra-fast response and excellent flow
    Low processing temperature and pressure
    Strong adhesion to substrates
    Stable at room temperature
    Suitable for direct etching and lift-off

    NXR-2000 Series, Photo-Curable Resists
    Sub-5 nm demonstrated resolution and wafer-scale uniformity
    Room temperature operation
    Super-low viscosity
    Spin-on or resist-drop dispensing
    Excellent etching resistance
    Low UV-curing dosage

    NXR-3000 Series, Underlayer Resists
    Optimizing direct etching and lift-off processes
    Excellent thermal stability
    Easy handling and processing
    Planarizing sample surfaces
    Strong adhesion to top layer resists and substrates

    NXR-4000 Series, Mold Materials
    Easy mold formation with one-step imprint
    Photo-curable
    Strong and durable when cured
    Stable mechanical and chemical properties

    NXT-100 Series, Surfactants for Nanoimprint
    Ensuring reliable mold-resist separation
    Promoting adhesion between resists and substrates
    Easy handling and processing
    Stable properties after treatment

Nanoimprint Masks

Nanonex offers a variety of NIL masks with periodic 1D and 2D patterns and provides customer mask services. Nanonex will also provide information and connections of potential NIL mask vendors.

Nanoimprint Applications

Nanonex provides NIL process recipes and guidance for fabrications in various fields including nanoscale electronics, display/optical, magnetics, biotech, materials, etc.