CMP Materials

Silanes for Chemical Vapor Deposition (CVD) and Spin-On Dielectrics (SOD), Silanes for Photolithography, Silica for Chemical-Mechanical Polishing (CMP), Hyperpure Hydrogen Chloride for Etching

CMP (Chemical Mechanical Polishing), Wet Cleaning Systems. Display Equipment: Wet Station, APP (Atmospheric Pressure Plasma Cleaner), CO₂Cleaner, Coater & Track System. CMP Slurry and nano dispersion solution

Semiconductor materials: CVD/ALD materials, Etch & Cleaning, HF/BOE, CMP Slurry, Cu metalizing. Display materials: Etchant, Organic Material, Thin Glass (OLED). Solar cell - Texturing : HF, HNO3 / Diffusion : POCl3, BBr3 / Etch & Cleaning : HF, BOE , HCl

Gas and chemical materials for semiconductor and display manufacturing processes. Analysis for semiconductor and display processes and various industrial process gases.

Semiconductor products: photoresists (PR), bottom anti-reflective coatings (BARC), spin-on-carbon (SOC), CMP slurries, wet chemicals, colored resist, organic insulating layer materials.

Chemical mechanical slurries and photoresist strippers, which are mainly used in the field of integrated circuit chip manufacturing and advanced packaging.

chemical mechanical polishing (CMP), grinding and other equipment and supporting consumables, as well as wafer reclaim services.

Polishing abrasives for silicon wafers and other semiconductor substrates, to chemical mechanical planarization (CMP) products required for multilayered circuits on semiconductor chips, and abrasives for computer hard disks.

Diamond Slurry, CVD Diamond Tools, PCD Diamond Tools, EF Drill Bits

CMP Consumable Parts: CMP Retainer Rings, Brushes, CMP Component Parts, Scrubber System Components, Precision Metal and Plastic Parts.

Lithography materials: g-line, i-line, EUV photoresists, immersion lithography materials, spin-on hardmask, CMP slurry, post CMP cleaning materials. Display materials: Liquid Crystal Alignment Films, Protective Coating Materials, OLED materials

CMP Pad, CMP slurry, mask blanks. Optical films for FPD.

CMP slurries, other chemicals for semiconductor

CMP slurries, other chemicals for semiconductor

chemical materials such as PHOTORESIST, HT-SOC, SLURRIES, RINSING SOLUTIONS, ETCHANT, and STRIPPERS and supplies them to the semiconductor, display, and eco-friendly industries.

CMP pads and slurries. Ultra-clean acids, bases and solids.

CMP equipment, chemical delivery systems, sorting metrology systems, polishing machine automation, polisher brush, diamond pad dresser.

Diamond blades, diamond cutting and grooving wheels, ultra-thin diamond blades. Diamond & CBN grinding wheels, diamond & CBN honing stones and sticks. Diamond slurries. Precision ceramic parts.

Grinding, lapping, polishing and CMP wafer process materials.

Polishing slurry, films and other materials. Surface and wafer edge polishing machines, inspection equipment.