Thermco Systems – Diffusion furnaces for the semiconductor, MEMS, nano, LED and photovoltaic industries
Established in 1962 in Orange County, California, Thermco Systems have over 50 years of experience in the manufacture of leading edge diffusion furnaces and today, Thermco has the largest installed base of horizontal diffusion furnaces in the world.
From our UK headquarters in Sussex, we supply equipment to the traditional semiconductor market and have developed specialised product versions which have been embraced by companies in the MEMS, LED, photovoltaic and nano industries.
Diffusion and LPCVD furnaces
For the semiconductor industry, Thermco offer hardware via their diffusion and LPCVD furnaces (low pressure chemical vapour deposition) and process solutions for all current semiconductor device technologies, including Bipolar, IGBT, MOS, Bi-CMOS, and MOSFET. For our diffusion and LPCVD furnaces, we have characterised all critical atmospheric and CVD processes for technologies down to 0.35 micron. These processes can also be used for non-critical (bulk processing) applications at advanced technology nodes. Standard processes include:
Atmospheric diffusion furnace
Wet oxidation
Dry oxidation
Inert gas anneal (N2, Ar, etc.)
Forming gas and H2 anneals
N type doping
P type doping
Low temp cure
High temp drive in
LPCVD diffusion furnace
Nitride
TEOS
HTO
Flat temp Polysilicon
Ramped temp Polysilicon
Doped Polysilicon (P and N type)
LTO
BPSG
Diffusion furnaces for LED
One of the fastest growing areas in the electronic fabrication industry is LED manufacturing technology. Our diffusion furnaces for LED have been designed to meet the specific needs of LED manufacturing, including low temperature anneals, load and unload of substrates in a controlled N2 atmosphere and annealing in an ultra-high vacuum environment.
As many LED process applications have a critical thermal budget and processes are performed at relatively low temperatures, our diffusion furnaces for LED include special low temperature heating chambers and controlled environment wafer loading systems. Typical processes for the diffusion furnaces for LED include:
Low temperature anneal with controlled ambient loading
Resist cure
Standard anneal/alloy process
Zinc and N2 doping
Diffusion furnaces for PV
Throughput and process are the drivers of the photovoltaic industry, so Thermco have developed a class-leading, fully automated solution based around its diffusion furnaces for PV to run fully characterised, industry-specific processes including POCL3, BBR3, BCL3, CVD Nitride, wet and dry oxide and H2 anneal for both mono and multi-Silicon.
Alongside our diffusion furnaces for PV, we have built a library of photovoltaic processes based on design of experiment and process knowledge, including recipes for controlled junction depth, anti-reflective coating and passivation. Standard processes include:
N type doping with POCL3 for surface and groove
P type doping with BBr3 for surface and groove
P type doping with B2H6 for surface and groove
Silicon Nitride for anti-reflective coating
Wet oxidation surface passivation
H2 anneal bulk passivation
In addition to the diffusion and LPCVD furnaces, diffusion furnaces for LED and diffusion furnaces for PV, Thermco Systems also offer a full range of service support, installation and modification. We can offer retro-fits and upgrades to many furnaces products as well as supporting the large installed base of Thermco Systems’ furnaces. We can update gas systems, control systems and automation from the simplest R&D furnace to complex production tools.
Thermco Systems – Specialists in MEMS furnace processes, MEMS furnace equipment and Low Stress CVD films for MEMS
Established in 1962 in Orange County, California, Thermco Systems have over 50 years of experience in the manufacture of leading edge diffusion furnaces and today, Thermco has the largest installed base of horizontal diffusion furnaces in the world.
From our UK headquarters in Sussex, we supply equipment to the traditional semiconductor market and have developed specialised product versions which have been embraced by companies in the MEMS, LED, photovoltaic and nano industries. For the MEMS industry, we specialise in MEMS furnace processes, MEMS furnace equipment and low stress CVD films for MEMs.
The particular challenges with MEMS furnace processes and MEMS furnace equipment are that the MEMS device films require excellent electrical and/or optical quality, low mechanical stress with high levels of uniformity and step coverage within typically very thickly deposited or grown films. Using Thermco standard recipes based on our years of experience, we can help you quickly and efficiently characterise your MEMS furnace processes.
Critical to most MEMS applications is quality of film, and this poses specific issues as the required films are typically much thicker than equivalent semiconductor applications. We are experts in low stress CVD films for MEMS and work closely with customers for specific applications. The following are our standard processes for MEMS:
Low stress Nitride
Oxy-Nitride / SIPOS
Polysilicon- doped and undoped
TEOS with highly uniform step coverage
Thick uniform oxide
Low temperature anneal
In addition to MEMS furnace processes and MEMS furnace equipment, Thermco Systems also offer a full range of service support, installation and modification. We can offer retro-fits and upgrades to many furnaces products as well as supporting the large installed base of Thermco Systems’ furnaces. We can update gas systems, control systems and automation from the simplest R&D furnace to complex production tools.
Thermco Systems – Industry leader in graphene chemical vapour deposition furnaces and low pressure chemical vapour deposition products
Established in 1962 in Orange County, California, Thermco Systems have over 50 years of experience in the manufacture of leading edge diffusion furnaces and today, Thermco has the largest installed base of horizontal diffusion furnaces in the world.
From our UK headquarters in Sussex, we supply equipment to the traditional semiconductor market and have developed specialised product versions which have been embraced by companies in the MEMS, LED, photovoltaic and nano industries.
For the semiconductor industry, Thermco offer hardware via their graphene chemical vapour deposition furnace and low pressure chemical vapour deposition products (LPCVD) and process solutions for all current semiconductor device technologies, including Bipolar, IGBT, MOS, Bi-CMOS, and MOSFET. For our graphene chemical vapour deposition furnaces and low pressure chemical vapour deposition products, we have characterised all critical CVD processes for technologies down to 0.35 micron. These processes can also be used for non-critical (bulk processing) applications at advanced technology nodes. Standard processes include:
LPCVD diffusion furnace
Nitride
TEOS
HTO
Flat temp Polysilicon
Ramped temp Polysilicon
Doped Polysilicon (P and N type)
LTO
BPSG
In addition to the graphene chemical vapour deposition furnaces and low pressure chemical vapour deposition products, Thermco Systems also offer a full range of service support, installation and modification. We can offer retro-fits and upgrades to many furnaces products as well as supporting the large installed base of Thermco Systems’ furnaces. We can update gas systems, control systems and automation from the simplest R&D furnace to complex production tools.
Thermco Systems – Experts in carbon nanotube growth systems and semiconductor processing equipment
Established in 1962 in Orange County, California, Thermco Systems have over 50 years of experience in the manufacture of leading edge diffusion furnaces and today, Thermco has the largest installed base of horizontal diffusion furnaces in the world.
From our UK headquarters in Sussex, we supply equipment to the traditional semiconductor market and have developed specialised product versions which have been embraced by companies in the MEMS, LED, photovoltaic and nano industries, including carbon nanotube growth systems.
Carbon nanotube growth systems
For nano technology, Thermco has characterised furnace applications such as carbon nanotube growth systems, DLC, Si Nano wires, graphenes and other related processes in both R&D and production systems. Standard or specialist pre-cursors can be used to allow for the growth of both doped and un-doped films, including:
SWCNT
MWCNT
DLC
Si Nano Wires
Graphenes
Semiconductor processing equipment
For the semiconductor industry, Thermco offer hardware via their semiconductor processing equipment and process solutions for all current semiconductor device technologies, including Bipolar, IGBT, MOS, Bi-CMOS, and MOSFET. For our semiconductor processing equipment, we have characterised all critical atmospheric and CVD processes for technologies down to 0.35 micron. These processes can also be used for non-critical (bulk processing) applications at advanced technology nodes. Standard processes include:
LPCVD Nitrate
LPCVD TEOS
LPCVD Polysilicon
In-Situ Doped Polysilicon (P and N type)
LPCVD BPSG
LPCVD VLTO
LPCVD HTO
Wet/Dry Oxide (with or without torch)
Pyrogenic Oxide with DCE, TCA, HCL
High Temperature Drive in
Forming Gas Anneal
Hydrogen Anneal
High Temp High Flow Anneal
Low Temp Cures or Anneals
POCL3 or BBr3 liquid dopant
In addition to carbon nanotube growth systems and semiconductor processing equipment, Thermco Systems also offer a full range of service support, installation and modification. We can offer retro-fits and upgrades to many furnaces products as well as supporting the large installed base of Thermco Systems’ furnaces. We can update gas systems, control systems and automation from the simplest R&D furnace to complex production tools.
