Tokyo Electron Ltd. engages in the development, manufacture, and sale of semiconductor production equipment and industrial electronics products for flat panel display manufacturing equipment. It operates through the following segments: Semiconductor Production Equipment (SPE), Flat Panel Display (FPD) Production Equipment and Others. The SPE segment handles the development, manufacture, service, and distribution of coaters/developers, plasma etch systems, thermal processing systems, single wafer deposition systems, cleaning systems, wafer probers, and other semiconductor production equipment. The FPD Production Equipment segment manufactures coater/developer for manufacturing flat panel display and Plasma etching/ashing device. The Others segment includes logistics, facilities management, and insurance businesses. The company was founded in November 11, 1963 and is headquartered in Tokyo,
Semiconductor
Coater/Developer
Etch system
Surface Preparation system
Deposition
Test system
Wafer Bonder/Debonder
SiC Epitaxial CVD system
Gas Cluster Ion Beam system
FPD
FPD
Coater/Developer
CLEAN TRACK™ LITHIUS Pro™ AP
Coater/Developer
CLEAN TRACK™ LITHIUS Pro™ Z
Coater/Developer
CLEAN TRACK™ LITHIUS Pro™ V/LITHIUS Pro™ V -i
Coater/Developer
CLEAN TRACK™ LITHIUS Pro™/LITHIUS Pro™ ｰi
Coater/Developer
CLEAN TRACK™ LITHIUS™/LITHIUS™ i+
Coater/Developer
CLEAN TRACK™ ACT™12/ACT™ 8
Coater/Developer
CLEAN TRACK™ ACT™12 SOD/ACT™ 8 SOD
SOD Coater
CLEAN TRACK™ ACT™ M
Photomask Coater/Developer
CLEAN TRACK™ Mark-Vz
Coater/Developer
CLEAN TRACK™ Mark 7/Mark 8
Coater/Developer
Etch system
Tactras™ Vigus™
Plasma Etch System
Certas LEAGA™
Gas Chemical Etch System
Tactras™ Vesta™
Plasma Etch System
Tactras™ RLSA™
Plasma Etch System
Tactras™ DRM
Plasma Etch System
Tactras™ SCCM™
Plasma Etch System
UNITY™ Me
Plasma Etch System
Surface Preparation system
CELLESTA™ -i MD
Single Wafer Cleaning System
CELLESTA™ -i
Single Wafer Cleaning System
EXPEDIUS™ -i
Auto Wet Station
EXPEDIUS™ +
Auto Wet Station
NS300Z
Scrubber System
NS300+ HT
Scrubber System
NS300
Scrubber System
SS4
Scrubber System
ANTARES™ -Nano
Single Wafer Cryokinetic Cleaning System
ANTARES™
Single Wafer Cryokinetic Cleaning System
ZETA™ 200/300
Batch Spray System
ZETA™ Semi-auto
Batch Spray System
Deposition
TELINDY PLUS™
Thermal Processing System
TELFORMULA™
Thermal Processing System
TELINDY PLUS™ IRad™
Plasma-Enhanced Batch Thermal ALD System
TELINDY™
Thermal Processing System
ALPHA(α)-303i
Thermal Processing System
ALPHA-8SE™
Thermal Processing System
ALPHA-8S
Thermal Processing System
NT333™
Atomic Layer Deposition System
Triase+™ EX-II™ TiN
Single Wafer Deposition System
Triase+™ Ti/TiN
Single Wafer Deposition System
Triase+™ W
Single Wafer Deposition System
Triase+™ SPAi
Single Wafer Plasma Treatment System
EXIM™
PVD System
MRT300
Magnetic Annealing
MRT5000
Magnetic Annealing
MRT200
Low field Magnetic Annealing
MATr
Magnetic Annealing
MATrSM
Setting Magnet
Test system
Cellcia™
Multi-Cell Test System
Precio™ XL
Wafer Prober
Precio nano™/Precio™
Wafer Prober
Precio octo™
Wafer Prober
TELPADS™-O
High-speed Probe Mark Automatic Inspection System
PN-300
Data Management System for Wafer Prober
N-PAF
Operation Support System for Wafer Prober
WDF™ 12DP+
Wafer/Dicing Frame Prober
Wafer Bonder/Debonder
Synapse™ Si
Wafer Bonder
Synapse™ V/Synapse™ Z Plus
Wafer Bonder/Debonder
SiC Epitaxial CVD system
Probus-SiC™
SiC Epitaxial CVD system
Gas Cluster Ion Beam system
UltraTrimmer Plus™
GCIB system Corrective Etching/Trimming
FPD
Betelex™
FPD Etch/Ash System
Impressio™
FPD Etch/Ash System
PICP™
FPD Etch/Ash System
HT-910
FPD Etch/Ash System
Exceliner™
FPD Coater/Developer
Elius™
Inkjet printing system for manufacturing OLED panels
