3D-Oxides proposes services to develop optimized growth processes for eco-sustainable, multi-element oxide thin films with novel properties. Our competitive advantage is our unique technology platform allowing both combinatorial and additive thin film growth approaches for faster and cost-efficient development of materials with optimized properties.
We thus propose R&D services to develop:
Multi-functional thin films addressed by combinatorial approach
Single step additive growth processes (to avoid etching steps)
Technology transfer to the customers with customized training and support
This allows our customers to focus on their business as we take care of the material process.
3D-Oxides provides a wide range of coated substrates with both single and multi-element oxide thin films on up to 6″ inch (150 mm) wafers.
We can provide either uniform coatings or with controlled gradients in either thickness (single element) or composition (multi elements).
TiO₂/SiO₂ multilayer coating with thickness gradient on 6" inch wafer.
As a standard product we can provide the following materials:
TiO2 (Titania) HfO2 (Hafnia) ZrO2 (Zirconia)
Al2O3 (Alumina) SiO2 (Silica) ZnO (Zinc Oxide)
Ta2O5 (Tantalum pentoxide) VOx (various Vanadium oxides) Nb2O5 (Niobium pentoxide)
LiNbO3 (Lithium Niobate) LiTaO3 (Tantalum Niobate)
3D-Oxides can also provide customized thin films based on the combination of several elements to choose among the available ones (in green) as reported in the previous Periodic Element Table. Within R&D projects we can investigate further materials, specifically those containing the elements in yellow and red in our table. We can also provide multi-layers of different materials and/or 3D patterned thin films.
We can provide on demand characterizations of delivered coatings :
Optical thickness mapping (thickness)
Chemical composition mapping
Crystalline phase
Further properties on demand
