We design, produce and sell metrology equipment for the characterization of semiconductor and photovoltaic materials, for monitoring the manufacturing process of semiconductor devices, flat panel displays and solar cells, and also for R&D purposes in these areas. We offer a variety of measurement techniques; most of them are non-contact and non-destructive. Many of our technologies can be flexibly integrated into different platforms, ranging from simple handheld devices and table-top systems with high resolution mapping capability to fully automated stand-alone production control tools for mid-range and high-level fablines. We also offer in-line measurements for solar cell production lines.
Our strategy is to continuously improve our products, and to offer flexible solutions for our customers’ needs with high-value products for a reasonable price. To accomplish this, we employ 1036 people worldwide, including 151 physicists and 90 engineers. We are happy to work together with our customers and partners to find suitable solutions for new challenges, and we also participate in various international R&D projects.
We carry out our work in a responsible way; we provide various benefits to our employees and support important cases such as scientific education.
Our history
Our company was founded in 1989 as a spin-off company by a team of scientists from the Research Institute for Technical Physics of the Hungarian Academy of Sciences. Historically, our first product was the DLTS, and the first carrier lifetime mapper was shipped in 1991. Since then, we have expanded our portfolio with electrical and optical measurement technologies, and our company has grown substantially: we became the market leader in the area of electrical metrology for solar cell manufacturing, and the 5th biggest pure-play semiconductor metrology company.
We accomplished this by an extensive amount of own R&D work and also by acquiring suitable assets and technologies. Semitest Inc. and its technologies for dielectric metrology and epi layer testing were acquired first in 2004, and we continue to develop and sell the products ever since. In 2008, assets of Sopra were purchased. Sopra was a company which produced the first commercially available spectroscopic ellipsometers in the world, and also had an exclusive license covering the technique of ellipsometry-porosimetry. These products are now supplied by Semilab, with a strong R&D base using the past Sopra expertise. The company, well-known for its contact and non-contact methods for epi layer, dielectric and implant characterization, SSM Inc. also joined the Semilab Group in 2008. In that year, QC Solutions was also acquired, with the high-frequency ac-SPV metrology for epi layers and implants. Expansion continued in 2009. Advanced Metrology Systems (AMS) joined and brought high-end technologies, such as model-based infrared reflectometry for 3D structure characterization and surface acoustic wave measurements for metal and low-k layers. Semiconductor Diagnostics Inc. (SDI) also merged with Semilab, bringing the cutting-edge SPV measurements for diffusion length determination and contamination monitoring down to levels as low as 1E8 iron atoms per cubic centimeter, and also micro-sized corona charging and Kelvin probe for on-product dielectric characterization. Technology licensing and acqusitions include ion implant monitoring methods from IBM and Applied Materials, solar cell inspection methods from Basler and more. In 2015, the assets of the Danish maker of atomic force microscopy equipment and related products, DME were acquired with key employees joining Semilab. Semilab continues with supplying of AFM technology and it’s integrating with other metrologies. In 2017, Nanoindentation business was acquired from Fischer-Cripps Laboratories.
Semilab now integrates all this expertise, which enables the development of a high-quality, versatile product portfolio.
Our global presence
Semilab is based in Budapest, Hungary, and has R&D and product centers in the USA (Tampa, FL and Billerica, MA), in Germany and in Denmark. It has direct sales and service offices in all major markets, including the USA, Japan, Korea, China, Taiwan, Singapore, and a network of representatives all over the world.
ACV-2200, ACV-3000, ACV-3100
ACV-2200,
ACV-3000,
ACV-3100
AIR-GAP CV PROFILING
CMS, CLS
CMS, CLS
SHEET RESISTANCE MEASUREMENT
Closed Cycle He-Cryostats for DLS
Cryostats for DLS
DEEP LEVEL TRANSIENT SPECTROSCOPY
DEEP LEVEL TRANSIENT SPECTROSCOPY - PV
DLS-1000
DLS-1000
DEEP LEVEL TRANSIENT SPECTROSCOPY
DEEP LEVEL TRANSIENT SPECTROSCOPY - PV
DLS-83D
DLS-83D
DEEP LEVEL TRANSIENT SPECTROSCOPY
DS-95 SPM Tip Scanner
DS-95 AFM
Objective for
optical
Microscopes
SCANNING PROBE MICROSCOPY (SPM) FOR NANO SURFACES
SCANNING PROBE MICROSCOPY (SPM) FOR R&D
SCANNING PROBE MICROSCOPY (SPM) OF 3D STRUCTURES
SCANNING PROBE MICROSCOPY (SPM) FOR DEFECT CHARACTERIZATION
DS-95 Compact Granite Stage
DS-95 Compact
Granite Stage
SCANNING PROBE MICROSCOPY (SPM) FOR NANO SURFACES
SCANNING PROBE MICROSCOPY (SPM) FOR R&D
SCANNING PROBE MICROSCOPY (SPM) OF 3D STRUCTURES
SCANNING PROBE MICROSCOPY (SPM) FOR DEFECT CHARACTERIZATION
DS-95 ProberStation 200
DS-95
ProberStation
200
SCANNING PROBE MICROSCOPY (SPM) FOR NANO SURFACES
SCANNING PROBE MICROSCOPY (SPM) FOR R&D
SCANNING PROBE MICROSCOPY (SPM) OF 3D STRUCTURES
SCANNING PROBE MICROSCOPY (SPM) FOR DEFECT CHARACTERIZATION
EIR-2500
EIR-2500
FTIR REFLECTOMETRY
EN-VISION
EN-VISION
EN-VISION
FAaST 300-SL
FAaST 300-SL
NON-CONTACT C-V PROFILING
FAaST 310/210 C-V / I-V
FAaST 310/210
C-V / I-V
NON-CONTACT C-V PROFILING
FAaST 310/210 SPV
FAaST 310/210 SPV
MINORITY CARRIER DIFFUSION LENGTH MEASUREMENT
FAaST 330/230 C-V / I-V
FAaST 330/230
C-V / I-V
NON-CONTACT C-V PROFILING
FAaST 330/230 DSPV
FAaST 330/230 DSPV
MINORITY CARRIER DIFFUSION LENGTH MEASUREMENT
FAaST 350 C-V / I-V
FAaST 350 C-V / I-V
NON-CONTACT C-V PROFILING
FAaST 350 DSPV
FAaST 350 DSPV
MINORITY CARRIER DIFFUSION LENGTH MEASUREMENT
FCV-3000
FCV-3000
ELASTIC METAL PROBE C-V PROFILING
FPP-1000
FPP-1000
FOUR POINT PROBE SHEET RESISTANCE
FOUR POINT PROBE SHEET RESISTANCE
FPT
FPT
SPECTROSCOPIC ELLIPSOMETRY
SPECTROSCOPIC ELLIPSOMETRY (LTPS)
FPT
FPT
SPECTROSCOPIC REFLECTOMETRY
IMAGING SPECTROSCOPIC REFLECTOMETRY
FPT
FPT
IMAGING SPECTROSCOPIC REFLECTOMETRY
SHEET RESISTANCE MEASUREMENT
CONTACT ANGLE
FPT
FPT
SHEET RESISTANCE MEASUREMENT
NON-CONTACT SHEET RESISTANCE MEASUREMENT
CONTACT SHEET RESISTANCE MEASUREMENT
FPT
FPT
MICROWAVE PHOTOCONDUCTIVE RESPONSE
CHIP QUALITY (LINE MURA AND µ-PCR)
IND-1000
IND-1000
NANOINDENTATION
IND-1500
IND-1500
NANOINDENTATION
inSE-1000
inSE-1000
SPECTROSCOPIC ELLIPSOMETRY
IR-2100, IR-2200, IR-2500, IR-3200
IR-2100,
IR-2200,
IR-2500,
IR-3200
MODEL-BASED INFRARED REFLECTOMETRY
LE-100IL
LE-100IL
SINGLE-WAVE ELLIPSOMETRY
LE-103PV
LE-103PV
SINGLE-WAVE ELLIPSOMETRY
LE-5100
LE-5100
SINGLE-WAVE ELLIPSOMETRY
LEI-1510EB, LEI-1510EC
LEI-1510EB,
LEI-1510EC
NON-CONTACT SHEET RESISTANCE BY EDDY CURRENT
LEI-1510EB-RP, LEI-1510EC-RP, LEI-1510EB-RS, LEI-1510EC-RS
LEI-1510EC-RP,
LEI-1510EC-RS
NON-CONTACT SHEET RESISTANCE BY EDDY CURRENT
LEI-1610E100AM, LEI-1610E100R
LEI-1610E100AM,
LEI-1610E100R
NON-CONTACT MOBILITY BY MICROWAVE REFLECTANCE
LEI-1616AM, LEI-1618AM, LEI-1616RP, LEI-1618RP
LEI-1616AM,
LEI-1618AM,
LEI-1616RP,
LEI-1618RP
NON-CONTACT MOBILITY BY MICROWAVE REFLECTANCE
LEI-3200RP
LEI-3200RP
NON-CONTACT MOBILITY BY MICROWAVE REFLECTANCE
LSL-2500 - Light Scattering Tomograph enhanced with Low-angle illumination
LSL-2500
LOW-ANGLE LIGHT SCATTERING TOMOGRAPHY
LST-2100, LST-2500HD
LST-2100, LST-2500HD
LIGHT SCATTERING TOMOGRAPHY
MCV-2200, MCV-2500
MCV-2200, MCV-2500
MERCURY CV PROFILING
MERCURY C-V PROFILING
MERCURY C-V PROFILING
MCV-530, MCV-530L
MCV-530, MCV-530L
MERCURY C-V PROFILING
MERCURY C-V PROFILING
MERCURY CV PROFILING
PDL-1000
PDL-1000
HIGH-SENSIVITY PARALLEL DIPOLE LINE (PDL) HALL MEASUREMENT
PLB-55
PLB-55
INFRARED BLOCK IMAGING
PHOTOLUMINESCENCE IMAGING
PLB-55i
PLB-55i
INFRARED BLOCK IMAGING
PLB-55r
PLB-55r
INFRARED BLOCK IMAGING
PLI-1001/A, PLI-1003/A
PLI-1001/A,
PLI-1003/A
PHOTOLUMINESCENCE IMAGING
PLI-101/A, PLI-103/A
PLI-101/A, PLI-103/A
PHOTOLUMINESCENCE IMAGING
PMR-3000
PMR-3000
PHOTO-MODULATED REFLECTIVITY MEASUREMENT
PN-100
PN-100
P/N TYPE DETERMINATION
PS-2000, PS-2500
PS-2000, PS-2500
ELLIPSOMETRIC POROSIMETRY
ELLIPSOMETRIC POROSIMETRY (R&D)
PSI-2100
PSI-2100, PSI-3000
POLARIZED INFRARED IMAGING
PV-2000A
PV-2000A
SHEET RESISTANCE MEASUREMENT
CARRIER LIFETIME (µ-PCD, QSS-µPCD)
LIGHT BEAM INDUCED CURRENT
NON-CONTACT C-V PROFILING
PVS-5000
PVS-5000
MICROCRACK INSPECTION
PHOTOLUMINESCENCE IMAGING
THICKNESS AND RESISTIVITY MEASUREMENT
PVS-5100
PVS-5100
µ-PCD CARRIER LIFETIME FOR WAFERS
GEOMETRY INSPECTION
SAW MARK INSPECTION
PVS-6000
PVS-6000
MICROCRACK INSPECTION
PHOTOLUMINESCENCE IMAGING
THICKNESS AND RESISTIVITY MEASUREMENT
SURFACE-CONTAMINATION AND CHIPPING INSPECTION
PVS-6000
PVS-6000
µ-PCD CARRIER LIFETIME FOR WAFERS
GEOMETRY INSPECTION
SAW MARK INSPECTION
QC-series
QC-series
SURFACE CHARGE PROFILING
R2R SE
R2R SE -
Roll-to-Roll
Spectroscopic
Ellipsometer
SPECTROSCOPIC ELLIPSOMETRY
RT-1000
RT-1000
BULK RESISTIVITY MEASUREMENT
RT-110
RT-110
BULK RESISTIVITY MEASUREMENT
RT-2500, RT-3000
RT-2500, RT-3000
SHEET RESISTANCE MEASUREMENT
Sample Transfer Shuttle
Sample
Transfer
Shuttle
SAMPLE TRANSFER SHUTTLE
SCI 1-6
SCI 1-6
COLOR MEASUREMENT FOR CELLS
SE-1000
SE-1000
SPECTROSCOPIC ELLIPSOMETRY
SE-100IL
SE-100IL
SPECTROSCOPIC ELLIPSOMETRY
SE-2000
SE-2000
SPECTROSCOPIC REFLECTOMETRY
SPECTROSCOPIC REFLECTOMETRY
SPECTROSCOPIC ELLIPSOMETRY
SE-2000
SE-2000
LIGHT BEAM INDUCED CURRENT
SPECTROSCOPIC ELLIPSOMETRY
SE-2000-IR
SE-2000-IR
SPECTROSCOPIC ELLIPSOMETRY
SE-2000EPA
SE-2000EPA
BULK RESISTIVITY MEASUREMENT
ELLIPSOMETRIC POROSIMETRY (R&D)
SE-2100
SE-2100
SPECTROSCOPIC ELLIPSOMETRY
VISUAL INSPECTION
SE-2100
SE-2100
SPECTROSCOPIC ELLIPSOMETRY
SPECTROSCOPIC HAZE AND REFLECTANCE
SE-3000
SE-3000
SPECTROSCOPIC ELLIPSOMETRY
SEIR-3000
SEIR-3000
MODEL-BASED INFRARED REFLECTOMETRY
SEM-AFM
SEM-AFM
Scanning Electron Microscope integrated Atomic Force Microscopy (SEM AFM)
SHR-1000
SHR-1000
SHEET RESISTANCE MEASUREMENT
SPL-2100 system
SPL-2100
SPECTRAL PHOTOLUMINESCENCE MEASUREMENT
SPL-2200 system
SPL-2200/2500
SPECTRAL PHOTOLUMINESCENCE MEASUREMENT
SRP-170 Spreading Resistance Profiler for silicon semiconductors
SRP-170
Spreading
Resistance
Profiler
SPREADING RESISTANCE PROFILING
SRP-2100 Spreading Resistance Profiler for all silicon semiconductors
SRP-2100
Spreading
Resistance
Profiler
SPREADING RESISTANCE PROFILING
SRP-2100i Spreading Resistance Profiler for wide bandgap materials
SRP-2100i
Spreading
Resistance
Profiler with
I-V capability
SPREADING RESISTANCE PROFILING
SW-3300
SW-3300
SURFACE ACOUSTIC WAVE MEASUREMENT
TTR-300
TTR-300
THICKNESS AND RESISTIVITY MEASUREMENT
WMT, WLT
WMT, WLT
THICKNESS AND RESISTIVITY MEASUREMENT
WT-1200 & WT-1200B
WT-1200 & WT-1200B
CARRIER LIFETIME (µ-PCD, QSS-µPCD)
WT-1200A
WT-1200A
CARRIER LIFETIME (µ-PCD, QSS-µPCD)
QUASI STEADY STATE -µPCD
WT-1200iL Ingot lifetime and resistivity tester
WT-1200iL
E-PCD CARRIER LIFETIME FOR MONO-Si
WT-2000
WT-2000
TCO SHEET RESISTANCE
MINORITY CARRIER DIFFUSION LENGTH MEASUREMENT
MINORITY CARRIER LIFETIME MEASUREMENT
WT-2000
WT-2000
FOUR POINT PROBE SHEET RESISTANCE
SHEET RESISTANCE MEASUREMENT
WT-2000 / 2A
WT-2000 / 2A
MINORITY CARRIER DIFFUSION LENGTH MEASUREMENT
WT-2000MCT
WT-2000MCT
MINORITY CARRIER LIFETIME MEASUREMENT
WT-2000P
WT-2000P
BULK RESISTIVITY MEASUREMENT
µ-PCD CARRIER LIFETIME FOR MULTI-Si
WT-2000PVN
WT-2000PVN
CARRIER LIFETIME (µ-PCD, QSS-µPCD)
LIGHT BEAM INDUCED CURRENT
WT-2000PVN
WT-2000PVN
FOUR POINT PROBE SHEET RESISTANCE
BULK RESISTIVITY MEASUREMENT
SHEET RESISTANCE MEASUREMENT
WT-2010D
WT-2010D
µ-PCD CARRIER LIFETIME FOR MULTI-Si
CARRIER LIFETIME (µ-PCD, QSS-µPCD)
WT-2200, WT-2500, WT-3000
WT-2200,
WT-2500,
WT-3000
SHEET RESISTANCE MEASUREMENT
WT-2200, WT-2500, WT-3000
WT-2200,
WT-2500,
WT-3000
MINORITY CARRIER LIFETIME MEASUREMENT
NON-CONTACT C-V PROFILING
WxL
WxL
CARRIER LIFETIME (µ-PCD, QSS-µPCD)
µSE-2500
µSE-2500
SPECTROSCOPIC ELLIPSOMETRY
