Annealsys is a leading manufacturer of RTP and DLI CVD / DLI-ALD systems for research production applications in the fields of silicon and compound semiconductors, nanotechnologies, MEMs, solar cells, glass, etc.

Annealsys Rapid Thermal Processing (RTP) furnaces can address various applications with an extended temperature range and vacuum capability.
The infrared lamp furnaces can perform annealing up to 1450°C and for duration up to 1 hour at 1200°C. The high temperature Zenith system can run process at 2000°C for 1 hour.
Applications include Rapid Thermal Annealing (RTA) processes like ohmic contact annealing and implantation annealing as well as Rapid Thermal Chemical Vapor Deposition (RTCVD) of graphene or hexagonal Boron Nitride (h-BN).
These versatile RTP systems can process samples from few mm² up to 200 mm diameter with manual loading or cassette to cassette robot handling for production, including customized solutions for processing compound semiconductor wafers with susceptors.

Economical 3-inch Rapid thermal processing system
Economical 3-inch RTP system for laboratories and education.Dual chamber version to avoid cross contamination issues.
The most powerful 3-inch rapid thermal processor for universities
The AS-Micro is a compact table top three-inch rapid thermal processor with vacuum capability dedicated to research applications.... Read more about AS-Micro

Rapid Thermal Processing furnaces for the development of rapid thermal annealing and CVD processes
Versatile Rapid Thermal Processing cold wall chamber furnaces. 4-inch (100 mm) and 6-inch (150 mm) versions.
The AS-One RTP system is available for processing up 100 mm or up to 150 mm diameter substrates.
The Annealsys AS-One system is available with two sizes of reactors to process substrates up to 100... Read more about AS-One

Rapid thermal processing system with square chamber
The AS-Premium reactor with the loadlock and turbo pumps provide oxygen free environment for silicon smoothening and other oxygen sensitive processes.
The Annealsys AS-Premium system can... Read more about AS-Premium
Rapid Thermal Processing / Rapid Thermal Chemical Vapor Deposition system.
Rapid Thermal Processing / Rapid Thermal Chemical Vapor Deposition system.
Versatile 200 mm RTP/RTCVD system from Research to Production. From RT up to 1450°C down to 10-6 Torr. Extended RTCVD capabilities (option).
Perfect RTP system for production applications
The AS-Master is the perfect RTP system for production applications with cassette to cassette loading system. The manual loading version can be used... Read more about AS-Master

Far and Near – Up to one hour at 2000°C
High Temperature RTP-CVD furnace up to 2000°C up to one hour.
The Zenith is high temperature RTP system that can run a one hour process at 2000°C
The Zenith-150 system can process samples up to 6-inch diameter at temperature up to 2000°C. It is specially... Read more about Zenith-150

Annealsys Direct Liquid Injection (DLI) deposition systems are using state of the art DLI vaporizers allowing the utilization of low vapor pressure and thermally unstable chemical precursors.
Annealsys is developing processes for the deposition of multi metallic oxides, metal, transition metal nitrides layers and also 2D materials including graphene, hexagonal boron nitride and transition metal dichalcogenides (TMDs).
Machines are available for substrates up to 50 mm, 100 mm or 200 mm diameter.
Small 3D parts (few centimeters size) can be processed in the 50 mm machine. Our DLI deposition systems offer multiprocess capabilities inside the same process chamber: DLI-CVD, DLI-ALD, MOCVD, pulse pressure CVD and even in-situ rapid thermal processing (RTP) for the MC-050.

All in one DLI system
Laboratory 2-inch DLI system.Multi-process capability in the same chamber: DLI-CVD, DLI-ALD, MOCVD, RTP, RTCVD.
Direct liquid injection vaporizers with lamps heating make the MC-050 a unique machine with multi process capabilities like a cluster tool but inside a single process chamber.
The Annealsys MC-050... Read more about MC-050

Easy multi process capabilities reactor for R&D
100 mm (4-inch) DLI-CVD / DLI-ALD deposition system.
The MC-100 with the rotating substrate heater and possibility to adjust the height of the substrate inside the reactor provides enhanced thin film uniformity.
The Annealsys MC-100 system is a 100... Read more about MC-100

Climb to the 200 mm step
The Annealsys MC-200 is a 200 mm DLI-CVD/ALD system for R&D.Capacitance plasma version is available.
For air sensitive applications the MC-200 can receive a motorized single wafer loadlock to isolate the process chamber from atmosphere.
The Annealsys MC-200 is a 200 mm thermally controlled wall... Read more about MC-200






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