Ion implantation platforms built for the future
Developed in collaboration with our customers, the Purion family of ion implanters is built to meet the challenges of fab processes at 10nm or less, today and into the future. Built on a 21st century architecture, the Purion platform is designed with unique enabling technologies to deliver the highest purity, precision and productivity—and the lowest cost of ownership.
One platform, multiple tools
All Purion ion implanters are based on a common, high-performance platform with three innovative beamline technologies. You enjoy the operational efficiencies of standardized equipment and controls, optimized to meet the needs of today’s most demanding High Current, Medium Current and High Energy applications.
High throughput, high consistency
The Purion platform’s advanced design delivers throughput of up to 500 WPH, maximizing productivity. As a true single-wafer platform, Purion ensures a level of consistency and repeatability unachievable with batch implanters.
Tailored to meet your needs
Have a special implantation or process requirement? Axcelis engineers will work with you to develop technology extensions to optimize your Purion implanter to your precise needs. As those needs evolve, so does your Purion platform—protecting your investment into the future.
