Semiconductors control a host of functions in electronic equipment. Nikon offers a stellar lineup of cutting-edge lithography systems that support precision circuit design down to the nanometer level.
Lithography Systems Alignment Stations Metrology/Inspection Systems
Products archive
Lithography Systems
ArF Immersion Scanners
NSR-S635E
[pdf]NSR-S635E leaflet (744KB)
Resolution ≦ 38 nm
NA 1.35
Exposure light source ArF excimer laser (193 nm wavelength)
Reduction ratio 1:4
Maximum exposure field 26 mm × 33 mm
Overlay SMO*1: ≦ 1.5 nm, MMO*2: ≦ 2.1 nm
Throughput ≧ 275 wafers/hour (96 shots)
*1Single Machine Overlay: machine-to-self overlay accuracy (NSR-S635E#1 to S635E#1)
*2Mix and Match Overlay: machine-to-machine overlay accuracy (NSR-S635E#1 to S635E#2)
NSR-S622D
[pdf]NSR-S622D leaflet (1.94MB)
Resolution ≦ 38 nm
NA 1.35
Exposure light source ArF excimer laser (193 nm wavelength)
Reduction ratio 1:4
Maximum exposure field 26 mm × 33 mm
Overlay SMO*1: ≦ 2 nm, MMO*2: ≦ 3.5 nm
Throughput ≧ 200 wafers/hour (125 shots)
*1Single Machine Overlay: machine-to-self overlay accuracy (NSR-S622D#1 to S622D#1)
*2Mix and Match Overlay: machine-to-machine overlay accuracy (NSR-S622D#1 to S622D#2)
ArF Scanners
NSR-S322F
[pdf]NSR-S322F leaflet (1.12MB)
Resolution ≦ 65 nm
NA 0.92
Exposure light source ArF excimer laser (193 nm wavelength)
Reduction ratio 1:4
Maximum exposure field 26 mm × 33 mm
Overlay SMO*1: ≦ 2 nm, MMO*2: ≦ 5 nm
Throughput ≧ 230 wafers/hour (96 shots)
*1Single Machine Overlay: machine-to-self overlay accuracy (NSR-S322F#1 to S322F#1)
*2Mix and Match Overlay: machine-to-machine overlay accuracy (NSR-S322F#1 to S322F#2)
KrF Scanners
NSR-S220D
[pdf]NSR-S220D leaflet (1.89MB)
Resolution ≦ 110 nm
NA 0.82
Exposure light source KrF excimer laser (248 nm wavelength)
Reduction ratio 1:4
Maximum exposure field 26 mm × 33 mm
Overlay SMO*1: ≦ 3 nm, MMO*2: ≦ 6 nm
Throughput ≧ 230 wafers/hour (96 shots)
*1Single Machine Overlay: machine-to-self overlay accuracy (NSR-S220D#1 to S220D#1)
*2Mix and Match Overlay: machine-to-machine overlay accuracy (NSR-S220D#1 to S220D#2)
i-line Steppers
NSR-SF155
[pdf]NSR-SF155 leaflet (1.80MB)
Resolution ≦ 280 nm
NA 0.62
Exposure light source i-line (365 nm wavelength)
Reduction ratio 1:4
Exposure field 26 mm × 33 mm
Overlay ≦ 25 nm
Throughput ≧ 200 wafers/hour (76 shots)
Alignment Stations
Litho Booster
[pdf]Litho Booster leaflet (680KB)
Litho Booster is an advanced Alignment Station that leverages proprietary Nikon technologies developed for semiconductor lithography systems. Absolute grid distortion values are measured quickly with ultra-high precision for all wafers prior to exposure. Correction values are then fed forward to the lithography system to greatly improve overlay accuracy without reducing throughput, contributing to enhanced yield and optimized equipment investments.
Metrology/Inspection Systems
Automatic Macro Inspection System AMI-5600/3500/3000 MarkⅡ
[pdf]AMI-5600/3500/3000 MarkⅡ leaflet (572KB)
The AMI makes both high throughput and exceptional detection sensitivity very achievable. It provides improved macro inspection accuracy, as well as greater inspection quantization and clarity, allowing more efficient process management.
Wafer Inspection System OPTISTATION-3200/3100/3000
[pdf]OPTISTATION-3200/3100/3000 leaflet (608KB)
The OPTISTATION is a wafer inspection system that enables simple and speedy manual visual inspection of 300 mm wafers. It contributes to dramatic increases in yields as an inline inspection system and analysis tool for R&D defect analysis.
Illumination System for Image Sensor Inspection N-SIS9/8
[pdf]N-SIS9/8 leaflet (596KB)
The N-SIS9/8 is an illumination system specialized for image sensor inspection. The system provides high-power, highly uniform illumination over a large inspection field, enabling high-speed illuminance setting and high-speed spectral settings including RGB.
Catalogs
[pdf]Semiconductor systems general catalog (1.16MB)
