JTEKT Thermo Systems Corporation

Vertical Furnace
Our flagship product. A broad lineup that ranges from experimental applications up to mass production with excellent temperature distribution and atmosphere control.
Applications : Semiconductor, SiC Power Semiconductor, MEMS, VCSEL, PV (Photovoltaic), FPD

VF-5700 Vertical Furnace for 300-mm Wafers

VF-5900 Vertical Furnace for 300-mm Wafers

VF-5300 Stocker Type Vertical Furnace for Mass Production

VF-5100 Turn Table Type Vertical Furnace for Mass Production

VF-3000 Low-Cost Mini Batch Vertical Furnace

VF-1000 Vertical Furnace for Small Production and R&D

Horizontal Furnace
Capable of vertically stacking up to 4 horizontal processing tubes. A general-purpose system that can utilize the installation area effectively.
Applications : Semiconductor, PV (Photovoltaic)

Model 200 Series Horizontal Furnaces for Mass Production and Experiments

Model 206A Horizontal Furnace for PV Production

Lamp Annealing System
A single wafer system that enables excellent in-plane temperature uniformity. Automatic or manual finger selection is possible.
Applications : Semiconductor, SiC Power Semiconductor

RLA-3100 Lamp Annealing System for Rapid Thermal Processing

RLA-1200 Lamp Annealing System for Rapid Thermal Processing

Clean Oven Systems
An optimal convection heating system for polyimide post-processing (back end process) and resist curing.
Applications : Semiconductor, FPD

SO2-12-F Heated-air Circulating Type Clean Oven for 300-mm Wafers

CLH Series High-Temperature Clean Ovens

Large Bore Vertical Furnace
A large bore vertical furnace for semiconductors. Super clean processing for FPD applications is possible.
Applications : PV (Photovoltaic), FPD

VFS-4000 Large Bore Vertical Furnace

SiC Power Semiconductor Equipment
A system specially designed for SiC power semiconductor heat treatment.
Applications : Semiconductor, SiC Power Semiconductor

VF-5300HLP Activation Annealing Furnace

VF-5300H Vertical Furnace for Gate Insulating Film Formation

RLA-4106-V Lamp Annealing System for Contact Annealing

VF-3000HLP Activation Annealing Furnace

VF-3000H Vertical Furnace for Gate Insulating Film Formation

RLA-3100-V Lamp Annealing System for Contact Annealing

JTEKT Thermo Systems is contributing to a wide range of heat treatments that are used in the manufacture of flat panel displays, film materials, and sheet materials. Examples include our clean heating systems for products such as liquid crystal displays (LCD) and organic EL (OLED), as well as our furnaces for sheet materials such as high-performance films and rechargeable battery electrode materials.

The workpieces treated with these types of equipment are evolving rapidly, in terms of both the materials and processes that affect the performance of the equipment, and their applications have expanded into new fields. As revolutionary performance is demanded of production equipment, JTEKT Thermo Systems proposes new solutions to meet customer needs based on the wealth of experience and technology which we have developed through our history.

Clean ovens for flat panel displays
Clean Oven, Single Substrate Transfer Type
Clean Oven, Single Substrate Transfer Type
CCBS series

High productivity, high clean factor, damage free. Supports operations in gaseous atmospheres
Applications : Post baking of color filter resist, annealing, seal main curing/pre-curing, baking polyimide coating

IR Furnace, Single Substrate Transfer Type
IR Furnace, Single Substrate Transfer Type
CCBS - IR series

High heating efficiency at high cleanliness
Supports operations in gaseous atmospheres
Applications: Baking polyimide coating, annealing, baking passivation film, seal main curing/pre-curing

Other equipment
Roller Hearth Continuous Furnace
Roller Hearth Continuous Furnace
RH series

Cleans and improves workplace environments.
Applications: High temperature baking of various kinds of paste and films of the FPD, solar panel
For more information, please contact us.

Resin Belt Type Drying Furnace
Resin Belt Type Drying Furnace
RB series

Causing no tension on the substrates due to adoption of the resin conveyor belt.
Achieving clean environment (Class 100) by reducing dust generation in the furnace.
Applications: Heat treatment of protection sheets and films
For more information, please contact us.

Clean Batch System CBS series
Clean Batch System CBS series

Our proprietary seal structure allows anti-oxidation treatment by charging inert gas.
An ultra high-temperature HEPA filter allows maximum operating temperature of 500°C.
The adoption of an oven forced cooling mechanism and faster substrate transfer enables high throughput.
Applications：Various annealing of LTPS (low temperature polysilicon) and TFT

For more information, please contact us.
Walking Beam Type Continuous Clean Oven WB series
Walking Beam Type Continuous Clean Oven WB series

A walking-beam system with superior clean performance is adopted for transport inside the oven.
High production efficiency is enabled by batch transport of glass substrate using heat-resistant cassettes.
Applications：Annealing of glass substrates

Manufacturing equipments with superheated steam atmospheres to meet a wide vraiety of needs. Superheated steam is colorless, transparent high-temperature steam gas (H2O) that was created by obtaining saturated steam that was evaporated at 100°C and heating it to higher temperatures. Because it has a specific heat that is higher than hot air and produces radiative effects, it is capable of rapid, uniform heating. Treatment is also possible in a low-oxygen atmosphere (residual oxygen concentration 20 ppm or less).
Applications : Saturate steam can be used for debinding and firing of MLCC and LTCC, and electrostatic chucks and other electronic and ceramic components, as well as drying and degreasing of metal components.

AllFit® Inert Gas Oven INH Series

AllFit® µBF Vacuum Purge Type Small Box Furnace

AllFit® Compact Conveyor Furnace

Continuous Furnace
Continuous transport type heat treatment furnace In addition to air, heat treatment is also possible in a hydrogen (H2), nitrogen (N2), or other atmosphere. In addition to the mesh belt type continuous furnace, the lineup also includes a type that utilizes a ceramic conveyor with superior heat and wear resistance.
Applications : These products are used for applications including firing of MLCC, LTCC, and inductors, firing of thick substrates, electrode drying, brazing, glass sealing, and ferrite sintering.

Mesh Belt Type Continuous Furnace Standard Muffle Type

Mesh Belt Type Continuous Furnace Hydrogen Type

Mesh Belt Type Continuous Furnace Multi-Inlet/Exhaust Type

Mesh Belt Type Continuous Furnace Compact Conveyor Furnace

Ceramic Conveyor Type Continuous Furnace

Oven series
The hot air circulation system produces ovens with superior soaking performance. Capable of N2 atmosphere treatments with residual O2 concentrations of 20 ppm or less. The lineup includes inert gas ovens and clean ovens with a class 100 cleanliness.
Applications : Ideal for applications including debinding of MLCC, LTCC, and inductors, drying, curing, annealing, hardening, and tempering.

High-Temperature Inert Gas Oven INH Series

High-Temperature Clean Oven CLH Series

Exhaust Gas Treatment Equipment GM Series

Continuous Oven
These continuous ovens utilize clean oven technologies for FPD production and experiments. They are used for electronic components, disks, glass epoxy substrates (epoxy/glass laminated substrates), and for film drying, curing, and annealing.
Applications : The can also be used for debinding of MLCC.

Continuous Oven