PLASSYS is a French company founded in 1987. Its main activity consists in designing and manufacturing equipment for thin film deposition and ion milling. For 30 years and counting, many prestigious public and private research centers have relied on PLASSYS expertise and know-how in vacuum technology and vacuum applications. As a testimony of our truly international presence, our customers are spread all over the world: France, USA, Russia, Canada, Japan, China, Germany, UK, etc.
PLASSYS’ range of product lines covers systems for thermal evaporation, electron beam evaporation, sputtering deposition, diamond growth by CVD, ion gun assisted deposition, and ion etching.
PLASSYS is also a supplier of small scale production systems. Our technology for thin films is mainly applied in semiconductor, superconductor, sensors, tribological and optical layers industries.
Sputtering systems HV/UHV
Ion milling
Diamond growth by MW-PACVD
Special and production machines
Qubit multi-chamber systems
Glove box integrated systems
Software control
Evaporation
Product lines ME and MEB
Lift-off processes
HMET, PHMET transistors
IR waveguides
Thermal barriers
Magnetic materials
MEMS encapsulation
Sputtering
Product line MP
Monolayers
Multilayers
Magnetic films
Optic films
Reactive sputtering
Ion milling
Product lines MG and MU
M-RAM
Interfaces
Micro tips
Diamond growth by MW-PACVD
Electronic grade CVD diamond
High growth rates
Doping with nitrogen or boron
Monocrystal (electronic or gem grade)
Polycrystal
Multi-monocrystal
2.45 GHz – 6 kW
Special application and production machines
Interface depostion
Multi-substrate processing
24/7 up time and throughput
Perfect reproducibility
Systems for quantum applications
Qubits
Superconductors
Josephson junctions
Multi-technology integration
Glove box integrated systems
Organic materials
Sensors
Add-on to existing machines
Software control
System drive and control via PC
Windows PRO with back-up
Multi-user, multi-level
